All carbon electronics based on graphene has been an elusive goal. For more than a decade, the inability to produce significant band-gaps in this material has prevented the development of graphene electronics. We demonstrate a new approach to produce semiconducting graphene that uses a submonolayer concentration of nitrogen on SiC sufficient to pin epitaxial graphene to the SiC interface as it grows. The resulting buckled graphene opens a band-gap greater than 0.7eV in the otherwise continuous metallic graphene sheet. The goal of developing all-carbon electronics requires the ability to dope graphene and convert it between metallic and wide band-gap semiconducting forms. While doping graphene by adsorbates or more elaborate chemical means has made rapid progress, 1-7 opening a band-gap in graphene has been problematic. Two routes to wide-band-gap semiconducting graphene have been pioneered: electron confinement and chemical functionalization. Electron confinement in lithographically patterned narrow graphene ribbons has been plagued by lithographic limits and edge disorder, 8-11 although recent results from sidewall grown graphene ribbon are showing new progress that could lead to band-gaps larger than 0.6eV. 12,13 Functionalized graphene band-gaps can be produced by imposing a periodic potential in the graphene lattice through ordered adsorbates 14,15 or ordered impurities replacing carbon atoms. 16 In this work we demonstrate a novel approach to bandgap engineering in graphene using a nitrogen seeded SiC surface. Rather than using chemical vapor deposition (CVD) or plasma techniques to dope graphene by post seeding the films with nitrogen, 5-7,17 we show that a submonolayer concentration of nitrogen adsorbed on SiC, prior to graphene growth, causes a large band-gap to open in the subsequently grown, continuous graphene sheets. Using X-ray photoemission spectroscopy (XPS), scanning tunneling microscopy (STM), and angle resolved photoemission spectroscopy (ARPES), we show that a submonolayer concentration of bonded nitrogen at the graphene-SiC interface leads to a 0.7eV semiconducting form of graphene.The band-gap is not due to chemical functionalization since the concentrations used in these studies are expected to have little effect on graphene's band structure. 16,18 Instead, STM topographs and dI/dV images, showing that the graphene is buckled into folds with 1-2nm radii of curvature, suggests two possible origins for the gap: either a quasi-periodic strain 19 or electron localization in the 1-2 nm wide buckled ribbons. 20