Excimer-Laser Assisted Deposition of Carbon and Boron Nitride-Based High-Temperature Superconducting Films

Reiße, G.; Weißmantel, Steffen

doi:10.1007/3-540-26667-4_26

Cited by 2 publications

(1 citation statement)

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“…Other methods to relax stress have been demonstrated. It has been shown that residual stress in ta-C films can be eliminated by UV excimer laser annealing [50,51] without reducing the fraction of sp 3 bonds; with UV excimer laser annealing, only a localized surface layer of a few hundred nanometers in depth is heated, so that the substrate is not heated in the process. A reduction of ta-C film stress down to ~2 GPa was also obtained by incorporating a fraction of boron in the films without decreasing the high sp 3 bonding content [52].…”

Section: A Euv Reflectancementioning

confidence: 99%

High reflectance ta-C coatings in the extreme ultraviolet

et al. 2013

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The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp 3 atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard singlelayer coating materials in the EUV spectral range below 130 nm. A selfconsistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors. 5962-5963 (1994). 9. G. F. Jacobus, R. P. Madden, and L. R. Canfield, "Reflecting films of platinum for the vacuum ultraviolet," J.Opt. Soc. Am. 53(9), 1084-1088 (1963). 10. W. R. Hunter, D. W. Angel, and G. Hass, "Optical properties of evaporated platinum films in the vacuum ultraviolet from 220 Å to 150 Å," J. Opt. Soc. Am. 69(12), 1695-1699 (1979). 11. G. Hass, G. F. Jacobus, and W. R. Hunter, "Optical properties of evaporated iridium in the vacuum ultraviolet from 500 Å to 2000 Å," J. Opt. Soc. Am. 57(6), 758-762 (1967). 12. J. T. Cox, G. Hass, J. B. Ramsey, and W. R. Hunter, "Reflectance and optical constants of evaporated osmium in the vacuum ultraviolet from 300 to 2000 Å," J. Opt. Soc. Am. 63(4), 435-438 (1973 Robertson, "Density, sp 3 fraction, and cross-sectional structure of amorphous carbon films determined by x-ray reflectivity and electron energy-loss spectroscopy," Phys. Rev. B 62(16), 11089-11103 (2000). 32. F. Xiong, Y. Y. Wang, and R. P. H. Chang, "Complex dielectric function of amorphous diamond films deposited by pulsed-excimer-laser ablation of graphite," Phys. Rev. B Condens. Matter 48(11), 8016-8023 (1993). 33. S. Waidmann, M. Knupfer, J. Fink, B. Kleinsorge, and J. Robertson, "Electronic structure studies of undoped and nitrogen-doped tetrahedral amorphous carbon using high-resolution electron energy-loss spectroscopy," J.

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Section: A Euv Reflectancementioning

confidence: 99%