Excimer laser patterning of superconducting BiSrCaCuO thin films

Abstract

Micrometre-wide patterning of BiSrCaCuO (BSCCO) superconducting thin films has been successfully accomplished using a pulsed KrF excimer laser with a wavelength of and a duration of 25 ns. Etch depth as a function of the number of laser pulses was almost linear over a wide range of incident laser energy densities. For example, a superconducting microstructure of BSCCO film, nominally wide and long, showed no degradation in or . The excimer laser patterning technique yields reproducible patterning without any degradation of superconducting properties. The etching bordering and surface morphology were examined using an atomic force microscope.

Effect of Annealing Time and Temperature on Microstructural and Superconducting Properties of (Bi,Pb)-2212 Thin Films Produced by Magnetron Reactive Sputtering

“…It is therefore necessary to fabricate the superconductors with the higher T c in the form of high quality thin films on a suitable substrate under convenient ambient conditions for numerous technological applications [7]. For years, several techniques such as coevaporation [30], laser ablation [31], the excimer laser etching [32], molecular beam epitaxy [33], ion beam sputtering [34], in-situ single chamber arc sputtering [35], chemical vapor deposition [36] and magnetron sputtering [37] have been experienced to obtain high quality thin film. The conventional sputtering methods, among others, are the most preferred technique owing to the reproducible deposition of the films accomplished quite easily compared to the other methods.…”

Effect of Bi deficiency on grain alignment of BiPb-2223 thin film fabricated using rf sputtering process and on critical current density properties

“…[14][15][16] Applications of the high T c superconductors to electronic devices, magnetic shields, microwave integrated circuits and resonators require the fabrication of high quality thin films. Different techniques such as magnetron sputtering, 17 coevaporation, 18 laser ablation, 19 ion beam sputtering, 20 in situ single chamber arc sputtering, 21 chemical vapour deposition, 22 the excimer laser etching, 23 molecular beam epitaxy 24 and radio frequency (rf) sputtering 25 have been employed successfully to fabricate high quality high T c superconducting thin films. The common requirement of these methods is heat treatment (sintering) after deposition.…”

Role of annealing time and temperature on structural and superconducting properties of (Bi, Pb)-2223 thin films produced by sputtering

“…In this respect, it is necessary to produce the superconductors with higher T c in the form of high quality thin films on a suitable substrate under convenient ambient conditions for numerous technological applications such as microwave integrated circuits, high-frequency devices, magnetic shielding devices and resonators [10]. In order to prepare high quality thin film superconductors, several techniques such as molecular beam epitaxy [21], laser ablation [22], the excimer laser etching [23], coevaporation [24], in situ single chamber arc sputtering [25], ion beam sputtering [26], chemical vapor deposition [27] and magnetron sputtering [28] have been experienced. The conventional sputtering methods, among others, are the most preferred technique owing to the reproducible deposition of the films accomplished quite easily compared to the other methods.…”