Materials exhibiting nodal-line fermions promise superb impact on technology for the prospect of dissipationless spintronic devices. Among nodal-line semimetals, the ZrSiX (X=S, Se, Te) class is the most suitable candidate for such applications. However, surface chemical reactivity of ZrSiS and ZrSiSe has not been explored yet. Here, by combining different surfacescience tools and density functional theory, we demonstrate that the formation of ZrSiS and ZrSiSe surfaces by cleavage is accompanied by the washing up of the exotic topological bands giving rise to the nodal line. Moreover, while the ZrSiS has a termination layer with both Zr and S atoms, in the ZrSiSe a reconstruction occurs with the appearance of Si surface atoms, particularly prone to oxidation. We demonstrate that the chemical activity of ZrSiX compounds is mostly determined by the interaction of Si layer with the ZrX sublayer. A suitable encapsulation for ZrSiX should not only preserve their surfaces from interaction with ox-This article is protected by copyright. All rights reserved. 2 idative species, but also provide a saturation of dangling bonds with minimal distortion of the surface.