2022
DOI: 10.1021/acsaelm.1c01133
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Expanding FEBID-Based 3D-Nanoprinting toward Closed High-Fidelity Nanoarchitectures

Abstract: 3D-nanoprinting via focused electron beam induced deposition (FEBID) is a highly flexible additive-fabrication technique that has gained importance in the past few years for its variable design possibilities on the micro and nanoscale. In this work, we show the transition from mesh-like toward closed (sheetlike) structures and the development of necessary compensations (height correction, temperature compensation, and proximity correction) to minimize deviations between the target structure and the actual depo… Show more

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Cited by 15 publications
(23 citation statements)
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References 31 publications
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“…Oben: 3-D-Deponate von Nanowänden unterschiedlicher Breite (W) hin zum vertikalen Nanodraht. 2) Unten: Ein Modell zum Schreibprozess und das daraus resultierende FEBID-Mikro-Deponat einer Amphore.…”
Section: Nanodruck Mit Elektronenstrahlenunclassified
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“…Oben: 3-D-Deponate von Nanowänden unterschiedlicher Breite (W) hin zum vertikalen Nanodraht. 2) Unten: Ein Modell zum Schreibprozess und das daraus resultierende FEBID-Mikro-Deponat einer Amphore.…”
Section: Nanodruck Mit Elektronenstrahlenunclassified
“…So lassen sich Punkte, Säulen und Wände bis hin zu komplexen dreidimensionalen Objekten schreiben (Abbildung rechts). 2,3) Der FEBID-Prozess Jeder, der REM-Bilder aufnimmt, kennt die ungewollte FEBID-Abscheidung durch Kohlenwasserstoffrestgase in der REM-Kammer. Diese Effekte werden in der Regel vernachlässigt, da die flächigen Abscheidungen oberflächenkonform und sehr dünn sind und so die Bildinformation nicht beeinflussen.…”
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“…Especially 3D-FEBID, where true three-dimensional architectures are built via slow lateral movements, is a very powerful tool that enables novel application concepts for plasmonics [ 12 ], nanomagnetics [ 18 , 19 , 20 ] and 3D-nanoprobe fabrication for scanning probe microscopy [ 21 , 22 ], among others. The technique that was mainly used to build mesh-like structures in the past [ 23 , 24 ], was recently expanded to closed or sheet-like objects, which strongly improved its options in terms of design flexibility [ 25 , 26 , 27 , 28 ]. This transition, however, entailed new challenges in terms of growth stability and spatially varying growth rates depending on the object dimensions as well as the position of the deposition point within said structure.…”
Section: Introductionmentioning
confidence: 99%
“…Since the most commonly used precursor (MeCpPt (IV) Me 3 ) notoriously exhibits rather high carbon contents, due to incomplete dissociation processes, the deposited structures hold low metal contents around [ 29 , 30 ]. This has a tremendous impact on the temperature conditions during the growth process, as the energy brought into the system by the electron beam can only be dissipated towards the substrate through the carbon-dominated material, which is a poor thermal conductor [ 28 , 31 ]. This geometry-dependent electron beam heating [ 32 , 33 ] leads in turn to an increased desorption of precursor molecules, which slows down the growth rate [ 34 ], leading to non-uniform conditions for deposition, especially for narrow but tall 3D nanostructures.…”
Section: Introductionmentioning
confidence: 99%
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