2010
DOI: 10.1007/s12043-010-0030-y
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Experimental analysis of current conduction through thermally grown SiO2 on thick epitaxial 4H-SiC employing Poole-Frenkel mechanism

Abstract: Electrical properties of SiO2 grown on the Si-face of the epitaxial 4H-SiC substrate by wet thermal oxidation technique have been experimentally investigated in metal oxide-silicon carbide (MOSiC) structure with varying oxide thicknesses employing Poole-Frenkel (P-F) conduction mechanism. The quality of SiO2 with increasing thickness in MOSiC structure has been analysed on the basis of variation in multiple oxide traps due to effective P-F conduction range. Validity of Poole-Frenkel conduction is established q… Show more

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Cited by 8 publications
(2 citation statements)
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“…where E denotes the applied electric field. For insulators such as SiO 2 on SiC, with deep traps, the onset voltage is in the 10 6 V/cm range 37 and hence this mechanism can be excluded here since high currents are transmitted through the film at rather low electric field. Other possibilities involve dispersive transport, observed in the band tails of amorphous Si, 38 nearest neighbor- 39 and variable range hopping.…”
Section: Carrier Transport Across Interphasesmentioning
confidence: 99%
“…where E denotes the applied electric field. For insulators such as SiO 2 on SiC, with deep traps, the onset voltage is in the 10 6 V/cm range 37 and hence this mechanism can be excluded here since high currents are transmitted through the film at rather low electric field. Other possibilities involve dispersive transport, observed in the band tails of amorphous Si, 38 nearest neighbor- 39 and variable range hopping.…”
Section: Carrier Transport Across Interphasesmentioning
confidence: 99%
“…Такой метод может найти применение, например, для повышения точности моделирования радиационной стойкости микросхем [14], оптимизации процесса изготовления структур КНИ, обеспечения применения специальных технологических методов предотвращения образования паразитного канала [15,16], а также отбраковки структур КНИ. В работах [17][18][19] встречаются упоминания о наблюдаемом в диоксиде кремния механизме электропроводности Пула-Френкеля, при котором плотность тока определяется концентрацией и энергетическим положением донорных центров. Эти наблюдения носили случайный характер и не были направлены на прогнозирование радиационно-индуцированного накопления заряда в захороненном оксиде структур КНИ.…”
Section: Introductionunclassified