Experimental and simulation analysis of concave-down resistance curve during electromigration in solder joints

Abstract

Resistance curves play a crucial role in detecting damage of solder joints during electromigration. In general, resistance increases slowly in the beginning, and then rises abruptly in the very late stage; i.e., the resistance curve behaves concave-up. However, several recent studies have reported concave-down resistance curves in solder joints with no satisfactory explanation for the discrepancy. In this study, electromigration failure mode in Sn2.5Ag solder joints was experimentally investigated. The bump resistance curve exhibited concave-down behavior due to formation of intermetallic compounds (IMCs). In contrast, the curve was concave-up when void formation dominated the failure mechanism. Finite element simulation was carried out to simulate resistance curves due to formation of IMCs and voids, respectively. The simulation results indicate that the main reason causing the concave-down curve is rapid formation of resistive Cu 6 Sn 5 IMCs in the current-crowding region, which are 9 times larger than Cu IMCs. Therefore, when Cu reacted with Sn to form Cu 6 Sn 5 IMCs, resistance increased abruptly, resulting in the concave-down resistance curve. V