Experimental and Theoretical Studies of Radical Production in RF CCP Discharge at 81-MHz Frequency in $\hbox{Ar/CF}_{4}$ and $\hbox{Ar/CHF}_{3}$ Mixtures

Рахимова, Т. В.; Braginsky, O.V.; Klopovskiy, K.S.; Kovalev, A. S.; Lopaev, Dmitry; Proshina, O. V.; Rakhimov, A. T.; Shamiryan, Denis; Vasilieva, A.N.; Voloshin, Dmitry

doi:10.1109/tps.2009.2023849

Cited by 24 publications

(42 citation statements)

References 74 publications

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“…HF þ CF plays an essential role in the loss channel of CF 2 . 19,22 Under our experimental conditions, the similar behaviors of the CF 2 density and H atom versus various parameters seem to validate this conclusion. In our experiment, when the pressure is 30 mTorr, the calculated residence time of CF 2 in the reactor is about 1 s, so that the pumping loss can be neglected.…”

Section: F the Production And Loss Mechanisms Of Cf 2 And Fsupporting

confidence: 80%

“…19,23,49 As the feed gas, the density of CHF 3 is about one order higher than CF 2 and HF in this experiment, thus we speculate that the reaction e þ CHF 3 ! CHF 2 þ Fþe is more important than the reactions e þ CF 2 !…”

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 66%

“…As reported by Rakhimova et al, we supposed the sticking coefficients of CF x (x¼1-3) radicals on the surface of the chamber wall or electrode to be 0.005. 19 The diffusion loss rate is larger than the loss rate on the chamber wall and electrodes, calculated using the formula 5, so the rate limiting step is the wall and electrodes loss. When the gas pressure is 30 mTorr and gas temperature fitted by the LIFBASE is about 350 K, the diffusion coefficient of CF 2 is calculated to be about 1 Â 10 3 cm 2 s À1 .…”

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 99%

“…According to the report, 19 we supposed that the sticking coefficient of F atom on the surface is about 0.1 and the diffusion coefficient of F atom is calculated to be about 1 Â 10 3 cm 2 s À1 . The F loss rate on the wall and electrodes is about 500 s À1 .…”

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 99%

“…[10][11][12] In order to understand the physical and chemical processes of fluorocarbon plasmas, both experimental and theoretical studies have been done over the past few decades. 2,4,8,[13][14][15][16][17][18][19] Haverlag et al reported the spatial densities distribution of CF x (x¼1À3) in capacitively coupled 13.56 MHz RF discharges in CHF 3 . 15 They found that CF 2 density is higher close to the driven electrode, and deduced that the CF x radicals are produced by ion sputtering of a deposited film.…”

Section: Introductionmentioning

confidence: 99%

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Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma

et al. 2013

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A combined spectroscopic method of absorption, actinometry, and relative optical emission intensity is employed to determine the absolute CF 2 density, the relative F and H densities, H atom excitation temperature and the electron density in dual-frequency (60/2 MHz) capacitively coupled CHF 3 /Ar plasmas. The effects of different control parameters, such as high-frequency (HF) power, low-frequency (LF) power, gas pressure, gap length and content of CHF 3 , on the concentration of radical CF 2 , F, and H and excitation temperature are discussed, respectively. It is found that the concentration of CF 2 is strongly dependent on the HF power, operating pressure and the proportion of CHF 3 in feed gas, while it is almost independent of the LF power and the gap length. A higher concentration ratio of F to CF 2 could be obtained in dual-frequency discharge case. Finally, the generation and decay mechanisms of CF 2 and F were also discussed. V C 2013 AIP Publishing LLC.

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Section: F the Production And Loss Mechanisms Of Cf 2 And Fsupporting

confidence: 80%

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 66%

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 99%

Section: F the Production And Loss Mechanisms Of Cf 2 And Fmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma

et al. 2013

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Modeling of Single and Dual Frequency Capacitive Discharge in Argon Hydrogen Mixture − Dynamic Effects and Ion Energy Distribution Functions

Voloshin

Mankelevich

Proshina

et al. 2016

Plasma Processes & Polymers

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Single (SF) and dual frequency capacitively coupled plasma (DF CCP) in (0–50%) H2/Ar mixtures was studied numerically with 1D hybrid (Particle‐in‐cell with Monte Carlo Collision + fluid) model. In SF (81 MHz) discharge the effect of hydrogen dilution is studied for the fixed discharge input power. Mechanisms of the plasma density decrease and variation of ions composition with H2 percentage are discussed. The effect of low‐frequency voltage on plasma density, ions composition, ions fluxes, and ions energy was studied in DF CCP (1.76–81 MHz) discharge in 5% H2/Ar gas mixture at low (20 mTorr) and high (100 mTorr) pressures.

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MHD Modeling of the Tip-to-Plane Plasma Arc Behaviour at Very High Pressure in CF4

Lebouvier¹,

Iwarere²,

Ramjugernath³

et al. 2014

Plasma Chem Plasma Process

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International audienceIn this paper, the behaviour of a tetrafluoromethane (CF4) plasma arc under conditions of low current (0.25–0.4 A) and very high pressure (10 and 50 atm) in a batch reactor is presented using a three-dimensional magnetohydrodynamic model. Our previous study provided an understanding to the influence of pressure on the experimentally observed instabilities in the horizontal configuration. For a deeper understanding of the influence of other plasma operating parameters on the instabilities observed for pure CF4, the interelectrode gap, as well as the operating current was investigated in this study. The interelectrode distance is investigated since, experimentally, the longer the arc, the more unstable. In case of a stable arc, it has been observed with the model that a higher pressure and a higher interelectrode distance leads to higher values in terms of quantity of gas treated and volumetric power; two parameters of significant interest to improve the efficiency of the process. In order to validate the results of the previous paper, original experiments were carried out successfully in a vertical configuration at pressures ranging from 10 to 50 atm. Indeed, the horizontal configuration does not permit the ignition of the arc discharge for pure CF4 at pressure higher than 3 atm. Thus, the potential of the high-pressure arc discharge for pure CF4 using the vertical configuration against the horizontal configuration is demonstrated

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Experimental and Theoretical Studies of Radical Production in RF CCP Discharge at 81-MHz Frequency in $\hbox{Ar/CF}_{4}$ and $\hbox{Ar/CHF}_{3}$ Mixtures

Cited by 24 publications

References 74 publications

Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma

Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma

Modeling of Single and Dual Frequency Capacitive Discharge in Argon Hydrogen Mixture − Dynamic Effects and Ion Energy Distribution Functions

MHD Modeling of the Tip-to-Plane Plasma Arc Behaviour at Very High Pressure in CF4

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