In this study, a comparison of the negative capacitance
vertical
tunnel field-effect transistor (NC-VTFET) and VTFET for biosensing
applications was conducted. Dielectrically modulated TFET demonstrates
better sensitivity than the traditional metal oxide field effect transistor
as a biosensor in label-free biosensing applications. The TFET biosensor,
however, has much room for advancement by enhancing its DC characteristics.
This research addresses the impact of ferroelectric gate oxide for
integration of negative capacitance (NC) effect with the SiGe heterojunction
pocket at the source–channel junction to enhance performance
for biosensor applications. By putting the NC layer over SiO2, the channel voltage increases with decreased subthreshold slope
and OFF current, thereby creating an NC effect. Because SiGe has a
narrow band gap, pocket doping of SiGe near the source channel junction
will increase the concentration of charge carriers, improving the
band-to-band tunneling. In order to aid in the integration of biomolecules
and to modulate band-to-band tunneling based on charge density (q
f), dielectric constant (k),
temperature, and cavity length, a cavity is additionally inserted
above the source channel junction and underneath the NC layer, near
to SiO2. These values were compared with and without the
incorporation of NC layer with respect to various electrical properties
such as drain current (I
d), sensitivity,
and electric field (E). According to the findings,
labeled and label-free biosensors’ sensitivity may be increased
by incorporating the NC effect into VTFET biosensors.