X-ray full-field microscopy is a promising method for nondestructive
observation of opaque materials because it can attain a high
resolution and wide field of view without sample scanning. We recently
developed hard x-ray objective optics, which are key devices for
full-field microscopy, based on total-reflection mirrors with high
throughput and achromatic properties. The objective optics consist of
two types of advanced Kirkpatrick–Baez mirrors configured as crossed
one-dimensional Wolter type I and type III optics. The designed optics
possessed magnification factors of 42–45 with a compact camera length
of approximately 2 m. The hard x-ray full-field microscope based on
this system was tested at the BL29XU beamline at SPring-8. We were
able to resolve 100-nm periods (50-nm line widths) of a resolution
test chart at a photon energy of 15 keV over 30 h, which demonstrated
the remarkable stability of this system. The image quality was
preserved over a wide photon energy range from 9 to 15 keV. A periodic
dot pattern with dot diameters of 300 nm, formed on a 775-µm-thick Si
substrate, was three-dimensionally visualized by computed
tomography.