Experimental investigation of inductively coupled plasma etching on cemented carbides

Lian, Yunsong; Mu, Chenliang; Xie, Chaoping; Yao, Bin

doi:10.1016/j.vacuum.2019.01.032

Cited by 13 publications

(4 citation statements)

References 31 publications

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“…Therefore, the mold fabrication and process parameters are vital to the final NIL resolution and quality. The NIL mold is normally fabricated through photolithography [ 12 ], laser direct writer (LDW) [ 13 ], or electron beam lithography (EBL) [ 14 , 15 ], and subsequent dry etching and photoresist removal [ 16 , 17 ]. In general, dry etching may cause surface roughness, especially on the pattern sidewalls; increased inductively coupled plasma (ICP) power often increases the etching rate [ 17 ]; however, the resultant retarded heat dissipation might create a rough etched surface.…”

Section: Characteristics and Issues In Thermal And Uv Nanoimprint Lithographymentioning

confidence: 99%

“…The NIL mold is normally fabricated through photolithography [ 12 ], laser direct writer (LDW) [ 13 ], or electron beam lithography (EBL) [ 14 , 15 ], and subsequent dry etching and photoresist removal [ 16 , 17 ]. In general, dry etching may cause surface roughness, especially on the pattern sidewalls; increased inductively coupled plasma (ICP) power often increases the etching rate [ 17 ]; however, the resultant retarded heat dissipation might create a rough etched surface. Additionally, cycles of etching and passivation are performed by switching SF 6 and C 4 F 8 gases in the Bosch process, where scallop structures are usually generated during the etch steps, causing significant roughness on the sidewall [ 18 , 19 , 20 , 21 ].…”

Section: Characteristics and Issues In Thermal And Uv Nanoimprint Lithographymentioning

confidence: 99%

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Interfacial Interactions during Demolding in Nanoimprint Lithography

Chen

Luo

et al. 2021

Micromachines

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Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g., thermal and UV-NIL). The second part reviews the process simulation during resist filling and demolding. The third and fourth parts discuss in detail the difficulties in demolding, particularly interfacial forces between mold (template) and resist, during NIL which limit its capability for practical commercial applications. The origins of large demolding forces (adhesion and friction forces), such as differences in the thermal expansion coefficients (CTEs) between the template and the imprinted resist, or volumetric shrinkage of the UV-curable polymer during curing, are also illustrated accordingly. The plausible solutions for easing interfacial interactions and optimizing demolding procedures, including exploring new resist materials, employing imprint mold surface modifications (e.g., ALD-assisted conformal layer covering imprint mold), and finetuning NIL process conditions, are presented. These approaches effectively reduce the interfacial demolding forces and thus lead to a lower defect rate of pattern transfer. The objective of this review is to provide insights to alleviate difficulties in demolding and to meet the stringent requirements regarding defect control for industrial manufacturing while at the same time maximizing the throughput of the nanoimprint technique.

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Section: Characteristics and Issues In Thermal And Uv Nanoimprint Lithographymentioning

confidence: 99%

Section: Characteristics and Issues In Thermal And Uv Nanoimprint Lithographymentioning

confidence: 99%

Interfacial Interactions during Demolding in Nanoimprint Lithography

Chen

Luo

et al. 2021

Micromachines

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“…After characterizing the mechanical properties of the cured resists, the UV-curable resists were UV imprinted on the pristine silicon mold with pillar arrays (figure 6). The subtle roughness (figure 6(d)) on the sidewalls may result from ICP etching [14]. The corresponding demolding force was measured from a clean separation between the mold and the cured resist using a uniaxial tensile system at room temperature.…”

Section: Demolding Force Measurementsmentioning

confidence: 99%

“…NIL technique utilizes a mold to mechanically press into a polymer resist [3,[6][7][8]. The mold is usually fabricated through photolithography [9], electron beam lithography (EBL) [10,11] or laser direct writer (LDW) [12] followed by dry etching such as inductively-coupled plasma (ICP) [13,14]. NIL is usually categorized into two types: thermal NIL and ultraviolet NIL (UV-NIL).…”

Section: Introductionmentioning

confidence: 99%

Nanoindentation behavior of UV-curable resist and its correlation with patterning defect in nanoimprint lithography

Chen

Luo

et al. 2020

J. Micromech. Microeng.

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Nanoimprint lithography (NIL) is a useful technique for nano/micropattern replication. For ultraviolet-NIL (UV-NIL), the volume shrinkage of the resist upon curing is strongly affected by the applied UV exposure, possibly due to the various degrees of cross-linking. The applied UV intensity also influences the mechanical behaviors of the cured resist and the demolding force separating between the mold and the cured resist. The mechanical properties of the resists cured at different levels are studied in detail by nanoindentation. The statistically derived defect rate of the replicated pattern strongly depends on the demolding process and the mechanical strength of the cured resist. By simply decreasing the applied UV exposure during curing, the volume shrinkage can be reduced to ∼3%. Such low volume shrinkage also induces high plasticity of the cured resist and low demolding force, which yield a low defect rate of replicated patterns (e.g. ∼1E-4) even with a blank silicon mold without surfactant coating. Several different types of patterning defects are found to be linked to the mechanical properties of the cured resists. The quantitative guidance on the tailoring of the mechanical properties of the cured resist for a targeting defect rate is provided. The information gained in this work will bring insights into resist formulation design and nanoimprint process optimization to improve the fidelity and mitigate the defect rate of the pattern transfer in UV-NIL.

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Precision Dressing and Truing of Diamond Grinding Wheel with V-tip

Ouyang

Huang

2023

Fabrication of Micro/Nano Structures via Precision Machining

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Experimental investigation of inductively coupled plasma etching on cemented carbides

Cited by 13 publications

References 31 publications

Interfacial Interactions during Demolding in Nanoimprint Lithography

Interfacial Interactions during Demolding in Nanoimprint Lithography

Nanoindentation behavior of UV-curable resist and its correlation with patterning defect in nanoimprint lithography

Precision Dressing and Truing of Diamond Grinding Wheel with V-tip

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