Ni-based superalloys and thin films have drawn the attention of researchers because of their extraordinary properties. In particular, Nickel Aluminides like Ni3Al thin films show excellent mechanical and tribological properties. They are good candidates for high-temperature applications as they show excellent corrosion and oxidation resistance properties. Several researchers have synthesized Ni3Al thin films via Chemical vapor deposition methods (CVD) and physical vapor deposition methods (PVD). Most of them have synthesized Ni3Al thin film via magnetron sputtering because of microstructural homogeneity and less contamination achieved by this process. To achieve better properties of these films, many alterations in terms of deposition parameters and doping have been experimented by researchers. This work reflects the review of work done in the area of depositing Ni3Al-based thin films via different techniques for high-temperature applications.