Experimental Study on the Density Peaking of an RF Plasma at a Low Magnetic Field

Wang, S. J.; Kwak, Jong-Gu; Kim, S. K.; Cho, Suwon

doi:10.3938/jkps.51.989

Cited by 3 publications

(2 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In helicon plasma, the density should be proportional to the external magnetic field B for a given mode, except for the case of 'low-field peak' [6][7][8][9][10]. The plasma along the tube axis is therefore considered to be uniform when the magnetic field is uniform.…”

Section: Introductionmentioning

confidence: 99%

Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

Zhang

Yang

Tan³

et al. 2019

Plasma Sci. Technol.

View full text Add to dashboard Cite

We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope (OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines (750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode (E-mode). As the discharge mode changes into the inductively coupled mode (H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode (W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon (H) and Trivelpiece-Gould (TG) waves.

show abstract

Section: Introductionmentioning

confidence: 99%

Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

Zhang

Yang

Tan³

et al. 2019

Plasma Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…Recently, low magnetic field helicon sources are proposed for space propulsion [5][6][7] and also can be used as sources for semiconductor applications 8 as they can drastically reduce the cost of the magnet power supply and subsequently the power consumption. Resonance absorption at low magnetic fields [9][10][11][12][13][14][15][16][17] less than 100 G in a helicon discharge when a magnetic field is increased contrary to its behavior of monotonic increase at higher magnetic fields 18 . All these experiments are carried out using uniform magnetic fields near the antenna.…”

Section: Introductionmentioning

confidence: 99%

Effect of inhomogeneous magnetic field on plasma generation in a low magnetic field helicon discharge

Yadav

Barada²,

Ghosh

et al. 2019

Physics of Plasmas

View full text Add to dashboard Cite

The ionization efficiency of helicon plasma discharge is explored by changing the low axial magnetic field gradients near the helicon antenna. The highest plasma density is found for a most possible diverging field near the antenna by keeping the other operating condition constant. Measurement of axial wave number together with estimated radial wavenumber suggests the oblique mode propagation of helicon wave along the resonance cone boundary. Propagation of helicon wave near the resonance cone angle boundary can excite electrostatic fluctuations which subsequently can deposit energy in the plasma. This process has been shown to be responsible for peaking in density in low field helicon discharges, where the helicon wave propagates at an angle with respect to the applied uniform magnetic field. The increased efficiency can be explained on the basis of multiple resonances for multimode excitation by the helicon antenna due to the availability of a broad range of magnetic field values in the near field of the antenna when a diverging magnetic field is applied in the source.

show abstract

Radial control of plasma uniformity and electron temperature by external plate biasing in a back diffused partially magnetized plasma

Das¹,

Karkari²

2021

Plasma Res. Express

View full text Add to dashboard Cite

Experimental Study on the Density Peaking of an RF Plasma at a Low Magnetic Field

Cited by 3 publications

References 0 publications

Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

Effect of inhomogeneous magnetic field on plasma generation in a low magnetic field helicon discharge

Radial control of plasma uniformity and electron temperature by external plate biasing in a back diffused partially magnetized plasma

Contact Info

Product

Resources

About