2011
DOI: 10.1063/1.3625944
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Experimental validation of the exponential localized states distribution in the variable range hopping mechanism in disordered silicon films

Abstract: International audienceCarriers transport in low temperature (600°C) polycrystalline silicon thin film transistor channel region is studied for devices biased from weak to strong inversion. Analysis is supported by the theory of the 3D variable range hopping model due to hopping between localized electronic states near the Fermi level. The corresponding density of states is determined following an exponential (tail states) distribution associated to the statistical shift of the Fermi level

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Cited by 9 publications
(3 citation statements)
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“…Even if the γ −1 value is not obvious, these results of our proposed bandgap shallow tail state model mean that γ −1 ∼ 3 nm is an appropriate value for the studied polycrystalline silicon NWs. Moreover, such a value has been recently reported for such N(E F ) behavior deduced from analysis of the field effect conductance of low-temperature ( 600 • C) N-channel polycrystalline silicon TFTs reporting experimental determination of shallow tail state distribution close to the conduction band [23]. In addition, these exponential states distributions are consistent with theoretical studies previously reported in the case of hydrogenated amorphous silicon [20,21].…”
Section: Resultssupporting
confidence: 90%
“…Even if the γ −1 value is not obvious, these results of our proposed bandgap shallow tail state model mean that γ −1 ∼ 3 nm is an appropriate value for the studied polycrystalline silicon NWs. Moreover, such a value has been recently reported for such N(E F ) behavior deduced from analysis of the field effect conductance of low-temperature ( 600 • C) N-channel polycrystalline silicon TFTs reporting experimental determination of shallow tail state distribution close to the conduction band [23]. In addition, these exponential states distributions are consistent with theoretical studies previously reported in the case of hydrogenated amorphous silicon [20,21].…”
Section: Resultssupporting
confidence: 90%
“…VRH is a common transport mechanism in disordered materials (see e.g. [13][14][15][16]) that have a substantial density of localized states close to the Fermi level, with spatially overlapping wavefunctions. For materials in which the density of states at the Fermi level is suppressed by Coulombic electron-electron interactions, VRH is expected to follow the Efros-Shklovskii [17,18] model-i.e.…”
Section: Introductionmentioning
confidence: 99%
“…VRH is a common transport mechanism in disordered materials [e.g. Pichon and Rogel 2011;Okada and Taniguchi 1997;Yosida and Oguro 1996;Hauser and Rodgers 1982] that have a substantial density of localized states close to the Fermi level, with spatially overlapping wavefunctions.…”
Section: Existing Variable-range Hopping Crossover Modelsmentioning
confidence: 99%