2019
DOI: 10.1109/ted.2019.2907070
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Exploring New Metal Electrodes for Ferroelectric Aluminum-Doped Hafnium Oxide

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Cited by 37 publications
(30 citation statements)
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“…To date, studies utilizing symmetric platinum electrodes have demonstrated wake-up only when cycling at large fields (e.g., 3.2–4.0 MV cm –1 ), , while lower fields of 2 MV cm –1 have been observed to cause fatigue immediately upon field cycling of devices with palladium electrodes . Studies with non-noble elemental contacts, such as nickel or tungsten, for which oxygen vacancy contributions are less well studied, also exhibit fatigue under cycling fields of 2 MV cm –1 . , While these prior data suggest trends exist for the impact of field magnitude on wake-up versus fatigue response, the origin of the field dependence on these effects is not yet fully understood. Regardless, it is evident that electrode chemistry impacts HfO 2 -based ferroelectric performance.…”
Section: Introductionmentioning
confidence: 99%
“…To date, studies utilizing symmetric platinum electrodes have demonstrated wake-up only when cycling at large fields (e.g., 3.2–4.0 MV cm –1 ), , while lower fields of 2 MV cm –1 have been observed to cause fatigue immediately upon field cycling of devices with palladium electrodes . Studies with non-noble elemental contacts, such as nickel or tungsten, for which oxygen vacancy contributions are less well studied, also exhibit fatigue under cycling fields of 2 MV cm –1 . , While these prior data suggest trends exist for the impact of field magnitude on wake-up versus fatigue response, the origin of the field dependence on these effects is not yet fully understood. Regardless, it is evident that electrode chemistry impacts HfO 2 -based ferroelectric performance.…”
Section: Introductionmentioning
confidence: 99%
“…IGZO as an oxide semiconductor can be a suitable solution because it has a clear interface without interdiffusion between the IGZO and HZO. The ferroelectricity of HfO 2 -based materials is usually obtained via TiN capping layer deposition on HZO and subsequent annealing. Various capping metals (W, Pt, Au, Pd, and Ta) have also been explored. , Besides, an oxide electrode RuO 2 can solve common side effects (fatigue, wake-up effect, domain pinning, and imprint) of ferroelectrics because it may serve as an oxygen vacancy reservoir, while the reactive TiN can be easily oxidized into TiO x N y or TiO 2 at the interface between HfO 2 and TiN . However, the electrode/ferroelectric/electrode structure is a two-terminal device with limited applicability.…”
Section: Igzo-based Electronic- And/or Photonic-synaptic Devicesmentioning
confidence: 99%
“…Various capping metals (W, Pt, Au, Pd, and Ta) have also been explored. 171,172 Besides, an oxide electrode RuO 2 can solve common side effects (fatigue, wakeup effect, domain pinning, and imprint) of ferroelectrics because it may serve as an oxygen vacancy reservoir, while the reactive TiN can be easily oxidized into TiO x N y or TiO 2 at the interface between HfO 2 and TiN. 173 However, the electrode/ ferroelectric/electrode structure is a two-terminal device with limited applicability.…”
Section: Igzo-based Electronic-and/ormentioning
confidence: 99%
“…In addition, eliminating the nonferroelectric Al 2 O 3 layer also helps reduce the depolarization field and enhance the retention time of the polarization. The retention time of the polarization in ferroelectric HfO 2 can exceed ten years [28]. The ferroelectric HZO films with high remanent polarization and long retention can provide reliable and low power storage of the target signals, enabling the in-memory analog computing in these devices.…”
Section: A Tunable Polarization and Dirac Voltage In Ferroelectric Gmentioning
confidence: 99%