Exploring the electron density in plasmas induced by extreme ultraviolet radiation in argon

Horst, van der; Beckers, JL Jozef; Osorio, EA; Banine, VY Vadim

doi:10.1088/0022-3727/48/28/285203

Cited by 22 publications

(73 citation statements)

References 18 publications

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“…The EUV source has previously been described by Van der Horst. 28 The used repetition frequency of the source is 500 Hz and the EUV pulses have a temporal FWHM of about 30 ns. Since this source also produces substantial amounts of UV and VUV, a 50 nm Si:Zr spectral purity filter (SPF) is used which transmits mostly between 10 and 20 nm.…”

Section: Methodsmentioning

confidence: 99%

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Ion energy distributions in highly transient EUV induced plasma in hydrogen

Ven

Reefman

Meijere

et al. 2018

Journal of Applied Physics

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This work reports on the measurements of ion flux composition and ion energy distribution functions (IEDFs) at surfaces in contact with hydrogen plasmas induced by extreme ultraviolet (EUV) radiation. This special type of plasma is gaining interest from industries because of its appearance in extreme ultraviolet lithography tools, where it affects exposed surfaces. The studied plasma is induced in 5 Pa hydrogen gas by irradiating the gas with short (30 ns) pulses of EUV radiation (k ¼ 10-20 nm). Due to the low duty cycle (10-4), the plasma is highly transient. The composition and IEDF are measured using an energy resolved ion mass spectrometer. The total ion flux consists of H þ ; H þ 2 , and H þ 3. H þ 3 is the dominant ion as a result of the efficient conversion of H þ 2 to H þ 3 upon collision with background hydrogen molecules. The IEDFs of H þ 2 and H þ 3 appear similar, showing a broad distribution with a cutoff energy at approximately 8 eV. In contrast, the IEDF of H þ shows an energetic tail up to 18 eV. Most probably, the ions in this tail gain their energy during their creation process by photoionization and dissociative electron impact ionization.

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Section: Methodsmentioning

confidence: 99%

“…The EUV pulse energy is measured before and after each measurement using a calorimetric power sensor, which has also been described by Van der Horst. 28 The pulse energy is 124 6 3 lJ.…”

Section: Methodsmentioning

confidence: 99%

Ion energy distributions in highly transient EUV induced plasma in hydrogen

Ven

Reefman

Meijere

et al. 2018

Journal of Applied Physics

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“…Section 2.5 describes the principle mechanisms behind the plasma formation and subsequent plasma dynamics, while Section 2.6 summarizes the relevant scaling laws with respect to the plasma densities to be expected under scanner conditions. It should be noted that-although measurements have been conducted in other gases, such as argon as well [11]-only EUV-induced plasmas in H 2 background gas are discussed in detail in this work. The reason for this is that today's lithographic tools are operated while using low pressure H 2 gas [3].…”

Section: Observation Of a Peculiar Phenomenon: Euv-induced Plasmamentioning

confidence: 99%

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

et al. 2019

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After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them.

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“…experiments simulations Figure 4: Comparison between the simulated (symbols) and measured (lines, data from [45]) time dependence of field averaged electron density for 1 (red), 5 (green), and 10 (blue) Pa argon.…”

Section: A Relation Of Field Averaged Electron Density and Simulatedmentioning

confidence: 99%

Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Astakhov

Goedheer

Lee

et al. 2016

J. Phys. D: Appl. Phys.

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We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.

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Exploring the electron density in plasmas induced by extreme ultraviolet radiation in argon

Cited by 22 publications

References 18 publications

Ion energy distributions in highly transient EUV induced plasma in hydrogen

Ion energy distributions in highly transient EUV induced plasma in hydrogen

EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology

Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

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