The temperature dependence of the free"carrier relaxation in ion-irradiated silicon-on-sapphire films has been investigated by picosecond photoconductivity measurements in the temperature range 90-295 K. The relaxation time of the photoconductivity decreases markedly with decreasing temperature in samples irradiated with small doses « 10 14 cm-2 ) ofSi ions, whereas nearly amorphized samples show no temperature dependence. This behavior is well described within a multiple-trapping model taking into account structural defects that are built in during the evaporation of the films as well as introduced by the ion irradation.