1999
DOI: 10.1002/(sici)1521-396x(199901)171:1<159::aid-pssa159>3.0.co;2-i
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Extended Point Defect Structures at Intersections of Screw Dislocations in Si: A Molecular Dynamics Study

Abstract: Molecular dynamics computer simulations have been employed with the Tersoff interatomic potential to examine the atomic structure of (aa2) h110i screw dislocations forming regular two-dimensional arrays in silicon. The main attention is focused on the atomic configurations of dislocation intersections. The dislocations are assumed to be undissociated, following HREM observations on the low-angle (001) twist boundaries produced by silicon wafer bonding in ultrahigh vacuum. It is shown that cores of the dislocat… Show more

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Cited by 13 publications
(3 citation statements)
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References 15 publications
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“…The resulting avalanche effect implies the bonding of the lower terraces, too. However, after bonding over double layer steps a disturbed interface and defects are left which may finally relax to 60Ûà hvhyà qvyphtions or shuffle-set dislocations accompanied by a row of vacancies [8][9][10]. Monolayer steps rotate the dimerization direction in the neighbouring domains and give rise to a stacking fault of either intrinsic or extrinsic type, depending on the dimer orientation in the adjacent terraces.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The resulting avalanche effect implies the bonding of the lower terraces, too. However, after bonding over double layer steps a disturbed interface and defects are left which may finally relax to 60Ûà hvhyà qvyphtions or shuffle-set dislocations accompanied by a row of vacancies [8][9][10]. Monolayer steps rotate the dimerization direction in the neighbouring domains and give rise to a stacking fault of either intrinsic or extrinsic type, depending on the dimer orientation in the adjacent terraces.…”
Section: Resultsmentioning
confidence: 99%
“…The MD simulations have successfully been used to describe ultra-high-vacuum bonding experiments for Si(100) [6], hydrogen passivated hydrophobic bonding processes [7], and to analyze the defect structure at bonded interfaces [8][9][10]. Simulations for SiC [11] were possible using the Tersoff [12] potential, whereas the predictions of the bondability of diamond have been performed using a bond-order potential [13].…”
Section: Introductionmentioning
confidence: 99%
“…11 To describe the interactions between silicon atoms, we use the Tersoff interatomic potential, 9 which has been used to predict structural properties of bulk a͒ silicon, 1 silicon surfaces, 12 and silicon defects. 13 To investigate the dependence of thermal properties on size along a particular direction ͑e.g., the thickness direction͒, we model the infinite silicon slab by applying the periodic boundary condition along the two in-plane directions. To eliminate periodicity along the thickness direction, a vacuum space of 3.0 nm is added on either side of the surface.…”
Section: Simulation Detailsmentioning
confidence: 99%