“…AgNO 3 , H 2 WO 4 (precursor), ammonia solution, and water (reactant) combined reaction that may occur on a heated substrate and lead to thin coatings. To produce WO 3 thin film on a heated substrate, the following reaction can take place between H 2 WO 4 (precursor), ammonia solution, and water (reactant) [ 26 , 27 ]. As deposited thin films are shown in Fig.…”