Extreme rejuvenation of a bulk metallic glass at the nanoscale by swift heavy ion irradiation

Khademorezaian, S.; Tomut, M.; Peterlechner, M.; da Silva Pinto, M.W.; Rösner, H.; Divinski, S.; Wilde, G.

doi:10.1016/j.jallcom.2024.173571

Journal of Alloys and Compounds

2024

DOI: 10.1016/j.jallcom.2024.173571

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Extreme rejuvenation of a bulk metallic glass at the nanoscale by swift heavy ion irradiation

S. Khademorezaian,

M. Tomut,

M. Peterlechner

et al.

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2024

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Cited by 1 publication

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Correlation between Crystallite Characteristics and the Properties of Copper Thin Film Deposited by Magnetron Sputtering: Bias Voltage Effect

Tadjine,

Alim,

Naitbouda

2024

JNanoR

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This work investigates the properties of copper thin films deposited by magnetron sputtering. The substrate is biased by a negative voltage (Vs), which controls the energy ions bombardment during the deposition of the thin films. In order to focus solely on the ions energy contribution, the power supply was fixed and the working pressure was selected at 5 Pa. This ensures energetic sputtered particles completely thermalized, by a sufficient number of collisions with the Argon gas. X-ray diffraction analysis revealed that substrate voltage Vs affects essentially the structure and size of the formed crystallites. The preferred orientation (111) and the larger crystallite size (30 nm) were achieved at Vs = - 60 V. The Cu (111)/(200) peak intensity ratio is maximal (12.55) at - 60 V, corresponding to the lowest resistivity value (6.33 mW.cm). Optimum corrosion resistance of the deposited thin film was achieved at -60 V. At high crystallite sizes, nanoindentation analysis showed a thin film that is more elastic (133 GPa) and less hard (1.96 GPa).

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Correlation between Crystallite Characteristics and the Properties of Copper Thin Film Deposited by Magnetron Sputtering: Bias Voltage Effect

Tadjine,

Alim,

Naitbouda

2024

JNanoR

View full text Add to dashboard Cite

show abstract

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Extreme rejuvenation of a bulk metallic glass at the nanoscale by swift heavy ion irradiation

Cited by 1 publication

References 97 publications

Correlation between Crystallite Characteristics and the Properties of Copper Thin Film Deposited by Magnetron Sputtering: Bias Voltage Effect

Correlation between Crystallite Characteristics and the Properties of Copper Thin Film Deposited by Magnetron Sputtering: Bias Voltage Effect

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