2004
DOI: 10.1063/1.1629153
|View full text |Cite
|
Sign up to set email alerts
|

Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations

Abstract: Xenon spectra involving emission from ion species of Xe7+ to Xe12+ were analyzed for a plasma focus discharge developed for extreme ultraviolet lithography. Low and higher resolution spectra were recorded in the 8–21 nm wavelength region for different operating conditions and different He–Xe gas mixtures. The spectra have been compared with Hartree–Fock calculations. The modeling included the distribution of the various xenon ion levels at a given electron equilibrium temperature and plasma opacity effects. Sp… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

2
52
0
1

Year Published

2005
2005
2023
2023

Publication Types

Select...
4
2

Relationship

0
6

Authors

Journals

citations
Cited by 70 publications
(55 citation statements)
references
References 33 publications
2
52
0
1
Order By: Relevance
“…The experimental data for comparison with artificial spectra are chosen for those parameters for which the xenon feature in the mixed Xe/O 2 plasma spectrum is comparable with the optimum spectrum of xenon observed for the Xe/He plasma spectrum for the maximum EUV in-band emission. The optimum electron density of 5 × 10 20 cm −3 and temperature of 40 eV for the EUV emission is determined using this method that compares well with the calculated data found in the literature [38,43]. To our knowledge, the plasma thermodynamic parameters were estimated for the first time using such a method.…”
Section: Thermodynamic Plasma Parameterssupporting
confidence: 64%
See 3 more Smart Citations
“…The experimental data for comparison with artificial spectra are chosen for those parameters for which the xenon feature in the mixed Xe/O 2 plasma spectrum is comparable with the optimum spectrum of xenon observed for the Xe/He plasma spectrum for the maximum EUV in-band emission. The optimum electron density of 5 × 10 20 cm −3 and temperature of 40 eV for the EUV emission is determined using this method that compares well with the calculated data found in the literature [38,43]. To our knowledge, the plasma thermodynamic parameters were estimated for the first time using such a method.…”
Section: Thermodynamic Plasma Parameterssupporting
confidence: 64%
“…6d). Smaller distances (e.g., H = 0.8 mm) turned out to be less effective because the xenon density is too high for the limited flux of the input pulse [43]. Fig.…”
Section: Measurements With the Transmission Grating Spectrographmentioning
confidence: 99%
See 2 more Smart Citations
“…Interest in extreme ultraviolet (EUV) ion spectroscopy has increased in the last few years [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] due in part to the need of the EUV lithography community to accurately model commercial EUV light sources. EUV lithography (EUVL) is targeted by the semiconductor industry to be used as the "next generation" technology that will deliver feature sizes projected by Moore's Law.…”
Section: Introductionmentioning
confidence: 99%