Extreme ultraviolet spectroscopy of a laser plasma source for lithography

Abstract

Spectra from various target materials from a KrF-laser plasma source have been investigated in the Extreme UV spectral range between 12 and 17 nm using an off-Rowland grazing-incidence spectrograph. Additional calibration of the yield at 13 nm and measurement of the spatial and temporal characteristics of the plasma has been done using and a combination of a multilayer mirror and XUV diode or fiber image carrier system.