Extremely compact soft X-ray lasers based on capillary discharges

Rocca, J.J.; Filevich, J.; Hammarsten, E.C.; Jankowska, E.; Benware, B.; Marconi, M.C.; Luther, B.; Vinogradov, A.; Artiukov, I.; Moon, S.; Shlyaptsev, V.N.

doi:10.1016/b978-0-444-51417-2.50119-x

Cited by 7 publications

(6 citation statements)

References 15 publications

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“…The 1.2 ns pulses of 46.9 nm radiation from the capillarydischarge Ne-like Ar laser at Colorado State University in Fort Collins, USA [7], were focused by a spherical Si/Sc multilayer-coated mirror [8] and used for the ablation of organic polymers.…”

Section: Methodsmentioning

confidence: 99%

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Juha

Bittner

Chvostová

et al. 2005

Journal of Electron Spectroscopy and Related Phenomena

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For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.

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Section: Methodsmentioning

confidence: 99%

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Juha

Bittner

Chvostová

et al. 2005

Journal of Electron Spectroscopy and Related Phenomena

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“…The Ne-like Ar capillary-discharge laser [33] built and operated at the Colorado State University provided nanosecond pulses (FWHM = 1.2 ns) of 46.9-nm radiation. Average pulse energy was ~ 130 µJ.…”

Section: Methodsmentioning

confidence: 99%

Short-wavelength ablation of solids: pulse duration and wavelength effects

et al. 2004

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For conventional wavelength (UV-Vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (λ < 100 nm) lasers emitting pulses with durations ranging from ~ 10 fs to ~ 1 ns have recently been put into a routine operation. This makes it possible to investigate how the ablation characteristics depend on the pulse duration in the XUV spectral region. 1.2-ns pulses of 46.9-nm radiation delivered from a capillary-discharge Ne-like Ar laser (Colorado State University, Fort Collins), focused by a spherical Sc/Si multilayer-coated mirror were used for an ablation of organic polymers and silicon. Various materials were irradiated with ellipsoidal-mirror-focused XUV radiation (λ = 86 nm, τ = 30-100 fs) generated by the freeelectron laser (FEL) operated at the TESLA Test Facility (TTF1 FEL) in Hamburg. The beam of the Ne-like Zn XUV laser (λ = 21.2 nm, τ < 100 ps) driven by the Prague Asterix Laser System (PALS) was also successfully focused by a spherical Si/Mo multilayer-coated mirror to ablate various materials. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for short pulses with those measured for ultrashort pulses, we can study the influence of pulse duration on XUV ablation efficiency. Ablation efficiencies measured with short pulses at various wavelengths (i.e. 86/46.9/21.2 nm from the above-mentioned lasers and ~ 1 nm from the double stream gas-puff Xe plasma source driven by PALS) show that the wavelength influences the etch rate mainly through the different attenuation lengths.

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“…X-ray lasers in the extreme ultra-violet (XUV or EUV) region using high voltage, high current capillary discharge Z-pinch plasmas have been demonstrated in several laboratories world-wide as a viable alternative to the above schemes (Ben-Kish et al 2001, Rocca et al 2003, Suckewer & Jaegl'e 2009and Tan & Kwek 2007. A compact table-top capillary discharge laser (pulse energy ∼13 μJ with divergence ∼ 5.2 mrad) with 12 Hz repetition rate had been reported by Heinbuch et al (2005).…”

Section: Introductionmentioning

confidence: 98%

Generation of intense soft X-rays from capillary discharge plasmas

Prasad

Nigam

Aneesh

et al. 2011

Sadhana

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X-ray lasing through high voltage, high current discharges in gas filled capillaries has been demonstrated in several laboratories. This method gives highest number of X-ray photons per pulse. The fast varying current and the j x B magnetic force compress the plasma towards the axis forming a hot, dense, line plasma, wherein under appropriate discharge conditions lasing occurs. At Laser Plasma Division, RRCAT, a program on high voltage capillary discharge had been started. The system consists of a 400 kV Marx bank, water line capacitor, spark gap and capillary chamber. The initial results of the emission of intense short soft X-ray pulses (5-10 ns) from the capillary discharge are reported.

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Extremely compact soft X-ray lasers based on capillary discharges

Cited by 7 publications

References 15 publications

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Short-wavelength ablation of solids: pulse duration and wavelength effects

Generation of intense soft X-rays from capillary discharge plasmas

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