2004
DOI: 10.1117/12.560413
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Short-wavelength ablation of solids: pulse duration and wavelength effects

Abstract: For conventional wavelength (UV-Vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (λ < 100 nm) lasers emitting pulses with durations ranging from ~ 10 fs to ~ 1 ns have recently been put into a routine operation. This makes it possible to investigate how the ablation characte… Show more

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Cited by 6 publications
(7 citation statements)
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“…The ablation of amorphous carbon is characterized by the occurrence of graphitization. Juha et al 58 determined the ablation yield as a function of uence well above the threshold, in the range of a few J cm À2 , obtaining 100-200 nm per shot in PMMA. The comparison between ns and fs pulses (at l ¼ 86 nm) indicated an approx.…”
Section: Optical Mechanisms Specic To Xuv/sxr Pulsesmentioning
confidence: 99%
See 1 more Smart Citation
“…The ablation of amorphous carbon is characterized by the occurrence of graphitization. Juha et al 58 determined the ablation yield as a function of uence well above the threshold, in the range of a few J cm À2 , obtaining 100-200 nm per shot in PMMA. The comparison between ns and fs pulses (at l ¼ 86 nm) indicated an approx.…”
Section: Optical Mechanisms Specic To Xuv/sxr Pulsesmentioning
confidence: 99%
“…Combined effects of short-pulse and short-wavelength have been studied by Juha et al 58 reporting ablation of molecular and covalent solids by ultra-short pulses of an X-ray FEL at l < 100 nm. The study proved a predominantly non-thermal character in the XUV ablation, with very smooth residual surface structures and a low ablation threshold.…”
Section: Xuv/sxr Laser In the Progress Of Laser Microanalysismentioning
confidence: 99%
“…Results have shown a dramatic drop, approx. factor of 10, of the threshold, but still there is a threshold [5]. The effects of EUV can however become significant, even when the pulse is unfocused.…”
Section: Introductionmentioning
confidence: 99%
“…EUV and so X-ray lasers therefore show promise to reduce the effects of the sample chemistry in laser-based mass spectrometry. [39][40][41] Our group at Colorado State University has developed an EUV laser ablation and ionization time-of-ight mass spectrometer (EUV TOF), a LAMS/LIMS technique that uses a capillary discharge laser producing pulses at a wavelength of 46.9 nm (26.4 eV photon energy) with a duration of $1.5 ns. [22][23][24] The EUV laser light can be focused down to spots less than 100 nm in diameter where it is absorbed within depths of tens of nanometers in most materials, 42 allowing for ablation of nanoscale (#100 nm) sized craters.…”
Section: Introductionmentioning
confidence: 99%