2013
DOI: 10.1063/1.4824729
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Extremely high electron mobility in isotopically-enriched 28Si two-dimensional electron gases grown by chemical vapor deposition

Abstract: Articles you may be interested inExperimental and theoretical analysis of the temperature dependence of the two-dimensional electron mobility in a strained Si quantum well

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Cited by 25 publications
(21 citation statements)
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“…Isotopically enriched, strained 28 Si thin layers were grown by solid-source molecular beam epitaxy (MBE) at the Technical University of Munich (TUM), Germany [42] and by CVD at Princeton University, USA. [43] Some electron doublequantum dots were fabricated using the strained silicon. [44] Other isotopically controlled silicon low-dimensional structures, typically grown by MBE, [45][46][47][48] have been employed, predominantly for diffusion [49][50][51][52] and amorphization [53] studies.…”
Section: Silicon Quantum Computationmentioning
confidence: 99%
“…Isotopically enriched, strained 28 Si thin layers were grown by solid-source molecular beam epitaxy (MBE) at the Technical University of Munich (TUM), Germany [42] and by CVD at Princeton University, USA. [43] Some electron doublequantum dots were fabricated using the strained silicon. [44] Other isotopically controlled silicon low-dimensional structures, typically grown by MBE, [45][46][47][48] have been employed, predominantly for diffusion [49][50][51][52] and amorphization [53] studies.…”
Section: Silicon Quantum Computationmentioning
confidence: 99%
“…A common approach to experimentally determine the dominant scattering mechanisms in two-dimensional systems is to extract the power-law exponent from the density dependence of the mobility. Several experimental and theoretical studies have used similar techniques to analyze disorder in GaAs/AlGaAs structures, [15][16][17][18][19][20][21] Si MOSFETs, 22 and doped 4,[23][24][25] and undoped [26][27][28] Si/SiGe heterostructures. With this in mind, we present in this work a systematic study of the depth dependence of scattering mechanisms in undoped shallow Si/SiGe quantum wells with channel depth ranging from 100 nm to only 10 nm away from the surface, the shallowest Si/SiGe device reported to date.…”
mentioning
confidence: 99%
“…Ensemble spin resonance of 31 P donors in isotopically pure 28 Si has shown extraordinarily long coherence times, T 2e % 10 s for the electron 13 and T 2n % 3 h for the nucleus, 14 and it is certainly an exciting prospect to adopt isotopically pure substrates for nanoscale qubit devices. However, the production of nuclear spin-zero environments in isotopically purified semiconductors other than silicon is relatively undeveloped 15 or impossible because of the lack of suitable isotopes. Therefore, methods to maximize qubit control fidelities in the presence of a nuclear spin environment will remain important.…”
mentioning
confidence: 99%