Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks

Jeon, Seokwoo; Park, Jang Ung; Cirelli, R.; Yang, Shu; Heitzman, Carla E.; Braun, Paul V.; Kenis, Paul J. A.; Rogers, John A.

doi:10.1073/pnas.0403048101

Cited by 285 publications

(321 citation statements)

References 33 publications

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“…A variant to holographic lithography in which the interference is created from a phase mask, as opposed to multiple beam interference, was demonstrated by Rogers and co-workers. [94] The phase mask is first defined in a 'master', fabricated through photolithography. This master is used to create a poly(dimethylsiloxane) (PDMS) flexible phase mask.…”

Section: Holographic Lithographymentioning

confidence: 99%

“…[94] The phase mask is first defined in a 'master', fabricated through photolithography. This master is used to create a poly(dimethylsiloxane) (PDMS) flexible phase mask.…”

Section: Holographic Lithographymentioning

confidence: 99%

“…The former are obtained by creating defects in the original 2D master template. [94] It should be possible to form the latter via direct laser writing, as demonstrated in PhCs obtained by multibeam holographic lithography. Optical characterization of these structures has yet to be published.…”

mentioning

confidence: 99%

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Introducing Defects in 3D Photonic Crystals: State of the Art

2006

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Public Reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comment regarding this burden estimates or any other aspect of this collection of information, including suggestions for reducing this burden, to Washington Headquarters Services, Directorate for information Operations and Reports, 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302, and to the Office of Management and Budget, Paperwork Reduction Project (0704-0188,) Washington, DC 20503. AGENCY USE ONLY ( Leave Blank)2. REPORT DATE Advanced Materials, 18, 2665-2678 (2006). 3D photonic crystals (PhCs) and photonic bandgap (PBG) materials have attracted considerable scientific and technological interest. In order to provide functionality to PhCs, the introduction of controlled defects is necessary; the importance of defects in PhCs is comparable to that of dopants in semiconductors. Over the past few years, significant advances have been achieved through a diverse set of fabrication techniques. While for some routes to 3D PhCs, such as conventional lithography, the incorporation of defects is relatively straightforward; other methods, for example, selfassembly of colloidal crystals (CCs) or holography, require new external methods for defect incorporation. In this review, we will cover the state of the art in the design and fabrication of defects within 3D PhCs. The figure displays a fluorescence laser scanning confocal microscopy image of a y-splitter defect formed through two-photon polymerization within a CC. SUBJECT TERMS 15. NUMBER OF PAGES 1416. PRICE CODE SECURITY CLASSIFICATION OR REPORT UNCLASSIFIED SECURITY CLASSIFICATION ON THIS PAGE UNCLASSIFIED SECURITY CLASSIFICATION OF ABSTRACT UNCLASSIFIED LIMITATION OF ABSTRACT UL IntroductionPhotonic crystals (PhCs) are materials that possess spatial periodicity in their dielectric constant on the order of the wavelength (k) of light. These materials can strongly modulate light [1] and, with sufficient dielectric contrast and an appropriate geometry, may exhibit a photonic bandgap (PBG). This concept was first proposed in 1975 by Bykov [2] but remained relatively unknown until the seminal work of Yablonovitch [3] and John. [4] In a rough analogy to semiconductors, which possess an electronic bandgap, a PBG material prohibits the existence of photons with energies in the PBG. PhCs are naturally classified by the dimensionality of their periodicity, and in order to rigorously prevent the propagation of PBG frequencies in all directions, a 3D PhC with an omnidirectional, or complete PBG (cPBG) is required. cPBG materials have been fabricated and well characterized for operation at microwave and radio frequencies, however, operation in the visible and IR requires the characteristic length scales of these structures to be scaled down by several orders of magnitude...

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Section: Holographic Lithographymentioning

confidence: 99%

“…[94] The phase mask is first defined in a 'master', fabricated through photolithography. This master is used to create a poly(dimethylsiloxane) (PDMS) flexible phase mask.…”

Section: Holographic Lithographymentioning

confidence: 99%

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Introducing Defects in 3D Photonic Crystals: State of the Art

2006

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“…Odom and co-workers have shown that trenches generated by phase-shift photolithography can be used to direct the assembly of semiconductor quantum dots (Figure 122.9c) [130], and the growth of ZnO nanowires (NWs) into ordered arrays [131]. More recently, Rogers and co-workers have demonstrated the fabrication of 3D nanostructures, which derive from a rather complex intensity distribution within the bulk of a relatively thick photoresist layer (Figure 122.9d) [127,128].…”

Section: Patterning Based On Edge Effectsmentioning

confidence: 99%

“…This technique uses a topographic phase mask to mediate exposure of a thin film of photoresist to UV light [120][121][122][123][124][125][126][127][128][129].…”

Section: Patterning Based On Edge Effectsmentioning

confidence: 99%