High-resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of 3D nanostructures that are technologically important but difficult to generate in other ways. In this approach, light passing through a phase mask that has features of relief comparable in dimension to the wavelength generates a 3D distribution of intensity that exposes a photopolymer film throughout its thickness. Developing this polymer yields a structure in the geometry of the intensity distribution, with feature sizes as small as 50 nm. Rigorous coupledwave analysis reveals the fundamental aspects of the optics associated with this method; a broad-range 3D nanostructures patterned with it demonstrates its technical capabilities. A nanoporous filter element built inside a microfluidic channel represents one example of the many types of functional devices that can be constructed.

Electrically tunable membranes with controllable permeability have been experimentally demonstrated by combining nanostructured and microstructured superhydrophobic surfaces with the phenomenon of electrowetting. Electrowetting allows dynamical tuning of the contact angle that the liquid forms with the membrane nanofeatures and microfeatures, thus controlling the flow of the liquid through the membrane and, therefore, tuning the permeability of the entire structure. “Smart” electrochemical energy storage cells that can be activated on demand have been built by combining these membranes and microfabricated Zn∕MnO2 electrodes. A typical open-circuit voltage of 1.55V and capacity of 200μAh∕cm2 have been demonstrated.

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We report on our recent investigations on the formulation and processing of 193 nm single layer photoresists based on alternating copolymers of cycloolefins with malefic anhydride. Resists formulated with cycloolefin copolymers are compatible with 0.262 N tetramethylammonium developers, have excellent adhesion, sensitivity, etch resistance and thermal flow properties. The effect of polymer structure and composition, dissolution inhibitor structure and loading as well as the effect of the photoacid generator on the resist dissolution properties was investigated. Based on the results high contrast formulations were evaluated on a GCA XLS (NA=0.53, 4X reduction optics) deep-UV stepper to exhibit 0.27 p m L/S pair resolution with excellent photosensitivity. Based on the dissolution properties and a spectroscopic examination of the resist, we have designed materials that show < 0.17 µm L/S pair resolution with 193 nm exposures on a ISI tool (NA=0.60, lox reduction optics). In this paper, the formulation methodology will be detailed and the most recent results upon both with 248 and 193 nm irradiation will be described.

A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9 tilt range device array. [977]