2019
DOI: 10.2478/awutp-2019-0006
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Fabrication and Characterisation of ZnO Thin Film by Sol–Gel Technique

Abstract: We investigated the structural and optical properties of zinc oxide (ZnO) thin film as the n-type semiconductor. In this work, the sol–gel method used to fabricate ZnO thin film on glass substrate with 0.5 mol/l of zinc acetate dehydrates. The crystals quality of the thin film analyzed by X-ray diffraction and the optical transmittance was carried out by an ultraviolet-visible spectrophotometer. The DRX analyses indicated that ZnO film have polycrystalline nature and hexagonal wurtzite structure with (002) pre… Show more

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Cited by 5 publications
(6 citation statements)
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“…where A is the absorbance of fabricated NiO thin films, ) and g E the bandgap energy of the semiconductor. However, the disorder or Urbach energy ( u E ) also was determined by the expression follow [27,28]: Figure 4. The band gap energy was observed a smaller than 3.5 eV, it is change and decreased with the increase in the deposition rate from 3.51 to 3.34 eV of 20 to 80 ml, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…where A is the absorbance of fabricated NiO thin films, ) and g E the bandgap energy of the semiconductor. However, the disorder or Urbach energy ( u E ) also was determined by the expression follow [27,28]: Figure 4. The band gap energy was observed a smaller than 3.5 eV, it is change and decreased with the increase in the deposition rate from 3.51 to 3.34 eV of 20 to 80 ml, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…ZnO has been widely employed in a variety of fields, including automobile manufacturing, medical equipment, interactions, computers, electronics, optoelectronics, biological materials, storing data, converting energy, as well as architecture. All previous applications indicate that ZnO it has unique features [1][2][3][4][5][6][7]. It is critical to determine which element or elements ZnO must be doped with in order to control the bands gap, conductivity, carrier's concentration and applications.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, there are numerous growing techniques in the literature to obtain ZnO thin films. [14][15][16] Among these, the chemical spraying technique can be seen as more advantageous due to its simplicity, cheapness, ease of use, and ability to work without vacuum at low temperatures, but obtaining a uniform film structure can be hard due to the need to control the droplet size and the distribution of thermogravimetric forces. 17,18 As mentioned above, due to the importance of transition metal-doped ZnO for device applications, it is important to investigate the performance of Cr-doped ZnO films as an interfacial layer obtained by the chemical spray pyrolysis technique in an Au/ZnO:Cr/p-Si device.…”
Section: Introductionmentioning
confidence: 99%