Metal-Semiconductor Schottky Barrier Junctions and Their Applications 1984
DOI: 10.1007/978-1-4684-4655-5_3
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Fabrication and Characterization of Metal-Semiconductor Schottky Barrier Junctions

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1991
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Cited by 84 publications
(139 citation statements)
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“…10. The straight line nature of this plot confirms the effect of image force on Schottky barrier height which is also supported by studies published in the literature [40]. Further measurements have been performed at room temperature to examine the effect of the scan rate on the Schottky barrier height b , ideality factor n and series resistance R s .…”
Section: Resultssupporting
confidence: 86%
“…10. The straight line nature of this plot confirms the effect of image force on Schottky barrier height which is also supported by studies published in the literature [40]. Further measurements have been performed at room temperature to examine the effect of the scan rate on the Schottky barrier height b , ideality factor n and series resistance R s .…”
Section: Resultssupporting
confidence: 86%
“…In practice, the value of the Schottky barrier may be further complicated by various physical and chemical phenomena, such as metal and semiconductor interdiffusion, chemical reactions, lateral junction non-uniformities, etc. Thus, metal±semiconductor junctions still attract a considerable amount of theoretical and experimental research, the results of which are described in detail elsewhere (see, e.g., [7,44]). In practice, 0 b is determined experimentally.…”
Section: Interface Space Charge Regionsmentioning
confidence: 99%
“…When the device is illuminated at 370 nm, the photo current increased to 6.27 Â 10 À 4 A at 1 V bias. The photo-to-dark current contrast ratio was found to be about 2.22 Â 10 5 at bias voltage of 3 V, which is attributed by the excitation of surface plasmons at the interface between ZnO:Ga and graphene layer [24].…”
Section: Resultsmentioning
confidence: 91%