Fabrication and reflection properties of silicon nanopillars by cesium chloride self-assembly and dry etching

Liu, Jing; Ashmkhan, Marina; Wang, Bo; Fu, Yi

doi:10.1016/j.apsusc.2012.05.099

Cited by 39 publications

(23 citation statements)

References 18 publications

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“…The CsCl film could develop nanoislands at a relative humidity and developing time compatible to the CsCl film thickness. Details of the developing conditions are listed in Table 1 [19]. Ti film of 40 nm thickness was deposited onto the substrate by thermal evaporation using a 99.99% pure Ti source, and the Ticoated structure was subsequently agitated by ultrasonication in deionized (DI) water for 2 min.…”

Section: Methodsmentioning

confidence: 99%

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Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell

Liu

Zhang

Sun

et al. 2015

Materials Science in Semiconductor Processing

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Section: Methodsmentioning

confidence: 99%

“…The nanoislands were originally fabricated through CsCl self-assembly method, which allows evaporation of the thermal coating, facile formation involving water, and removal using water [18][19][20][21]. Titanium (Ti) template as etching masks against the anisotropy corrosion was formed by lift-off CsCl nanoislands.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell

Liu

Zhang

Sun

et al. 2015

Materials Science in Semiconductor Processing

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“…Secondly,t he nanopillars were fabricated by using ICP dry etching with the CsCl nanoislands as masks.F inally,t he wafer was soaked in deionized water to remove the residual masks. [20,21] With this method, silicon nanopillars of heights from 0.2 to 0.5 mmw ere successfully fabricated as an antireflection layer for solar cells.…”

Section: Experimental Section Nanopillar Arrays Fabricationmentioning

confidence: 99%

Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective‐Area Silicon Nanopillars by Cesium Chloride Self‐Assembly Lithography as Antireflective Layer

et al. 2015

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Selective‐area nanopillar‐textured solar cells were fabricated by using a convenient method to overcome the problem of metal contacts on the nanopillars surfaces. A Ti/Ag electrode layer was deposited onto the planar surface after phosphorous doping, and then the nanopillars were fabricated on the surface by using cesium chloride (CsCl) self‐assembly lithography. With this method, nanopillars of approximately 150 nm average diameter and heights from 120 to 480 nm [corresponding inductively coupled plasma (ICP) etching time from 15 to 75 s] were fabricated on silicon surface as an antireflection layer. Compared with the solar cell with nanopillar arrays covering the entire front surface, the selective‐area nanopillars device exhibited better electrode contacts, and consequently better performance: the photovoltaic conversion efficiency (PCE) improved from 12.38 to 15.58 %. The heights of the nanopillars also had a significant effect on the PCE of the solar cells, for which the nanopillars of 240 nm height produced the solar cell with the best performance.

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“…26−28 Compared with metals, cesium chloride (CsCl) self-assembly has been recently used to fabricate structures with larger distributions by controlling film thickness and relative humidity and by developing time. 29,30 CsCl can be easily removed with water; thus, this material does not leave behind any contaminants. However, one should note that the gaps between nanostructures should be controllable to allow polymers to infiltrate and form thin films on the Si surface.…”

Section: Introductionmentioning

confidence: 99%

Efficiency Enhancement of PEDOT:PSS/Si Hybrid Solar Cells by Using Nanostructured Radial Junction and Antireflective Surface

Chen

Con

et al. 2013

ACS Appl. Mater. Interfaces

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ABSTRACT:We demonstrate the implementation of a hybrid solar cell that comprises a surface nanostructured ntype Si and poly(3,4-ethylenedioxythiophene):poly-(styrenesulfonate). The Si surface before deposition of the organic layer was nanostructured by using CsCl self-assembled nanoparticles as a hard mask and dry etching to form radial junction architectures and enhance light diffusion and absorption. Apart from the textured Si surface, processing parameters such as from metal-electrode shadow ratio, spincoating rate, and surfactant addition were properly adjusted to improve overall cell performance. Our hybrid solar cells achieve the best performance under optimized cell parameters with a power conversion efficiency of 8.84% and short-circuit current density of 30.5 mA/cm 2 . This combined technique provides a simple, scalable, and cost-effective process for fabricating hybrid solar cells.

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Fabrication and reflection properties of silicon nanopillars by cesium chloride self-assembly and dry etching

Cited by 39 publications

References 18 publications

Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell

Fabrication of inverted pyramid structure by Cesium Chloride self-assembly lithography for silicon solar cell

Overcoming the Problem of Electrical Contact to Solar Cells Fabricated using Selective‐Area Silicon Nanopillars by Cesium Chloride Self‐Assembly Lithography as Antireflective Layer

Efficiency Enhancement of PEDOT:PSS/Si Hybrid Solar Cells by Using Nanostructured Radial Junction and Antireflective Surface

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