2012
DOI: 10.1016/j.nimb.2011.01.053
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Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

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Cited by 10 publications
(8 citation statements)
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“…For ion beam analysis, the chamber contains a sample stage on a 2-D translatable and 6-axis rotatable goniometer, and detectors such as SSB (silicon surface barrier) detector, Si(Li) detector and optical fibers for Rutherford Backscattering Spectrometry (RBS), Elastic non-Rutherford Backscattering (EBS), Particle Induced X-ray Emission (PIXE) and Ionoluminescence (IL) analyses, respectively. For microbeam lithography, systems of a programmable L-shape micro-aperture [10] and a tapered glass micro-capillary [11] have been developed and installed in the chamber, respectively.…”
Section: Facilitiesmentioning
confidence: 99%
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“…For ion beam analysis, the chamber contains a sample stage on a 2-D translatable and 6-axis rotatable goniometer, and detectors such as SSB (silicon surface barrier) detector, Si(Li) detector and optical fibers for Rutherford Backscattering Spectrometry (RBS), Elastic non-Rutherford Backscattering (EBS), Particle Induced X-ray Emission (PIXE) and Ionoluminescence (IL) analyses, respectively. For microbeam lithography, systems of a programmable L-shape micro-aperture [10] and a tapered glass micro-capillary [11] have been developed and installed in the chamber, respectively.…”
Section: Facilitiesmentioning
confidence: 99%
“…However, our experimental results showed that in the utilization of the L-shaped aperture for microbeam, the aperture edge scattering did not significantly affect the pattern edge sharpness [3,15] so that the pattern quality could be guaranteed. Some examples of applications in MeV microbeam lithography using the L-shaped micro-aperture have been reported [10]. In a recent investigation on blister formation on PMMA induced by the aperture microbeam, we determined the blister-free condition of 2-…”
Section: Applicationsmentioning
confidence: 99%
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“…Because of its degradation upon exposure to irradiation, it is known that poly(methyl methacrylate), PMMA, is a positive photo‐resist. Thus, it has gained more extensive research in radiolysis investigations than many other polymers, mainly for its application in the semiconductor industry where PMMA has important applications in ion beam lithography 17‐20 …”
Section: Introductionmentioning
confidence: 99%
“…The LOC technology generally uses microfluidics for manipulating liquids flowing in microchannels (Squires and Quake 2005;Whitesides 2006). Actuation and control of the flow of liquids in such devices can be hydraulic (syringe pump) (Puttaraksa et al 2012), electrokinetic (Bousse et al 2000), acoustic (Yeo and Friend 2009), centrifugal (Cho et al 2007), and capillary (Juncker et al 2002;Puttaraksa et al 2013). However, many of these methods require external components, e.g.…”
Section: Introductionmentioning
confidence: 99%