Advances in nanoscale fabrication provide access to the smallscale phenomena that underpin fi elds of research such as plasmonics and subwavelength optics. [ 1 ] The choice of substrate for these nanostructures can defi ne the scope of their utility. Nanostructures on an optical-fi ber facet obtain the advantages of a miniaturized substrate that can be interrogated remotely and deployed in vivo and in vitro. However, fabrication on fi ber facets is challenging, because of their unusually small 125 μ m diameter and their large aspect ratio. To date, demonstrations of fi ber-facet nanopatterning have used interference lithography (IL), [ 2 ] electron-beam lithography (EBL) [3][4][5] and focused ion-beam lithography (FIB) [ 6 , 7 ] as fabrication techniques. The transfer of EBL nanostructures to fi ber facets has also been demonstrated, [ 8 , 9 ] achieving 25 nm feature separations. However, IL can produce only limited geometries, while EBL and FIB are unsuited to high-throughput fabrication.In contrast, nanoimprint lithography (NIL) provides largearea, high-resolution nanofabrication at low cost and highthroughput. New platforms that have been explored for NIL include mask aligners, [ 10 ] roll-to-roll imprinting, [ 11 ] optical-fi ber lengths [ 12 ] and optical-fi ber-facets (OFF-NIL). To date, OFF-NIL has demonstrated periodic diffraction features with dimensions 250 nm, [ 13 ] and 630 nm, [ 14 , 15 ] and nanorods for surface-enhanced Raman scattering (SERS) with diameters ∼ 110 nm. [ 16 ] All of these demonstrations of fi ber-facet nanopatterning have been limited to single-fi ber processing. Given the typical facet diameter of 125 μ m, there is clear opportunity for increased throughput via parallel OFF-NIL with large-area molds. Fiber-ribbons would seem an appropriate candidate for parallel fabrication, [ 17 ] however these are restricted in the type and number of fi bers available, and require specialized stripping and cleaving tools. Additionally, the cleaved ribbon-facets are restricted to a single plane.In this paper, we demonstrate an elegant, low-cost, highly accessible platform for imprinting arrays of optical-fi ber facets.We show that by segmenting optical-fi bers into short lengths and loading them into separate U-grooves, many fi bers can be imprinted in parallel. Over-sizing these U-grooves enables the fi bers to independently slide back-and-forth, and to self-align once they contact the mold, eliminating the need for critical proximity control during imprinting. Using this platform, we have achieved sub-15 nm feature separations across fi ber arrays. Further, using this system with large-area molds eliminates the need for critical lateral alignment. The demands on the imprinting platform are thus reduced to providing coarse, uniaxial translation, allowing us to demonstrate a compact, portable module for fi ber-array imprinting. Finally, self-alignment uniquely accommodates non-planar molds, allowing us to employ a biological nanotemplate.Arrays of optical-fi bers were created using arrays of ...