2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) 2015
DOI: 10.1109/nano.2015.7388978
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Fabrication of bow-tie antennas with mechanically tunable gap sizes below 5 nm for single-molecule emission and Raman scattering

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Cited by 5 publications
(3 citation statements)
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“…First proposed in 1997 [31], bow-tie antennas designed for optical frequencies have then been widely studied for near-field imaging [32] or for molecular detection [33]. Their bow-tie shape (see Figure 5a) allows for EM field amplification between two and three order of magnitude in between the two tips of each antenna, as shown in the simulation 5b.…”
Section: Bow-tie and Yagi-uda Antennasmentioning
confidence: 99%
“…First proposed in 1997 [31], bow-tie antennas designed for optical frequencies have then been widely studied for near-field imaging [32] or for molecular detection [33]. Their bow-tie shape (see Figure 5a) allows for EM field amplification between two and three order of magnitude in between the two tips of each antenna, as shown in the simulation 5b.…”
Section: Bow-tie and Yagi-uda Antennasmentioning
confidence: 99%
“…While highly repeating patterns of nanostructures aid in increasing their functional area and result in effects associated with the patterns themselves, another strategy can be leveraged to increase signal enhancement by creating plasmonic hotspotsthat of introducing nanoscale gaps between adjacent structures. This gap enhancement effect is drastically increased for gaps around and below 10 nm, and it has been demonstrated for various fabrication strategies and applications, including SERS, at the 1–10 nm scale. Some experimental demonstrations of tunable-gap SERS substrates have even been demonstrated at the sub-20 nm scale. The electric field strength resultant within such nanoscale gaps increases nearly exponentially over this range; hence, for optimal enhancement, the user would desirably produce the smallest possible separation between structures.…”
Section: Introductionmentioning
confidence: 99%
“…However, such gaint enhancement is only found in structures with extremely fine feature size not compatible with standard lithographic fabrication. [16][17][18][19] In this paper, we applied topology optimization with realistic fabrication constraints to engineer metal nanostructures and experimentally demonstrated SERS enhancement factor (EF) of 5 × 10 4 based on topology-optimized designs. While this EF is less than those reported in several previous works 18,20 , it is achieved using direct lithographic patterning with a specified resolution limit of 20 nm and no post-lithography process is implemented to reduce the feature size.…”
Section: Introductionmentioning
confidence: 99%