Molecular Nanowires and Other Quantum Objects 2004
DOI: 10.1007/978-1-4020-2093-3_6
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Fabrication of Carbon Nanotube Field Effect Transistors by Self-Assembly

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Cited by 4 publications
(4 citation statements)
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“…This thin oxide layer serves as the back-gate dielectric to maximize the gate efficiency. We then prepared the CNTFETs using a selective placement technique of carbon nanotubes as reported elsewhere [36][37][38][39]. Briefly, regions for the selective placement of CNTs on SiO 2 are defined by electron-beam lithography on a poly(methyl methacrylate) (PMMA) layer.…”
Section: Methodsmentioning
confidence: 99%
“…This thin oxide layer serves as the back-gate dielectric to maximize the gate efficiency. We then prepared the CNTFETs using a selective placement technique of carbon nanotubes as reported elsewhere [36][37][38][39]. Briefly, regions for the selective placement of CNTs on SiO 2 are defined by electron-beam lithography on a poly(methyl methacrylate) (PMMA) layer.…”
Section: Methodsmentioning
confidence: 99%
“…The SWNTs are then connected in a transistor geometry (Cr/Au source and drain electrodes, spaced by 100 to 500 nm) using the heavily doped and oxidized silicon substrate (200 nm of SiO 2 ) as back-gate. Elaborating on pioneering works using an electrostatic interaction between the SWNTs and the SAM, we recently showed that a high yield of highly selective deposition of individual SWNTs in predefined areas of the substrate, and thus a high yield of CNTFETs fabrication, was possible using simultaneously a SWNT organic solvent dispersion and deposition on an optimized SAM. The SWNT raw material used in the present work was produced by a laser ablation technique at Dresden University and purified by an optimized soft acidic treatment . The purified SWNTs were dispersed by moderate sonication in N -methyl pyrrolidone (NMP), which proves the solvent of choice for a high yield of selective deposition onto the APTS patterns.…”
mentioning
confidence: 99%
“…This kind of studies started with the pioneering works of Liu et al [42], Muster et al [43] and Choi et al [6]. The combination of adapted organic solvent and well organized monolayers allowed us to control both the deposition density and selectivity [7][8][9]. The process can be summarized as follows: electron-beam lithography is performed on PMMA deposited on the SiO 2 surface of a Si substrate.…”
Section: Selective Placement Of Nanotubesmentioning
confidence: 99%
“…In this article, we present our strategy to build and study electronic devices starting from commercial nanotubes and going through different steps of chemical purification [3,4], solubilization, functionalization [4,5] and assembly [6][7][8][9][10][11][12]. We think that these steps are the key to the development of innovative electronic functions.…”
Section: Introductionmentioning
confidence: 99%