2007
DOI: 10.1016/j.mee.2007.01.151
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Fabrication of diffraction gratings for hard X-ray phase contrast imaging

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Cited by 212 publications
(168 citation statements)
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“…25 The analyzer grating is manufactured by KIT using the LIGA process. 26 The periods and the depths of the gratings are listed in Table II.…”
Section: Grating Interferometer Geometrymentioning
confidence: 99%
“…25 The analyzer grating is manufactured by KIT using the LIGA process. 26 The periods and the depths of the gratings are listed in Table II.…”
Section: Grating Interferometer Geometrymentioning
confidence: 99%
“…The source-to-G1 distance was 25 m and the distance between G1 and G2 was 0.12 m, corresponding to the third fractional Talbot distance of the phase grating. The phase grating G1 (π shifting, period p 1 = 3.98 µm) and the absorption grating G2 (p 2 = 2.00 µm) were made of silicon and silicon filled with electroplated gold respectively [16]. The x-ray camera consisted of a luminescent screen (100 µm YAG:Ce) lenscoupled (1:1 magnification, f-number 2.5, 150 mm focal length) to a CCD camera (PCO2000).…”
Section: Grating Interferometer and Experimental Setupmentioning
confidence: 99%
“…19 The common fabrication procedure for these masks consists of a photolithography process followed by electroplating where heavy elements such as gold are usually used. 20 A number of techniques have been proposed to fabricate x-ray absorption gratings/masks as well as increase their performance, most of which were through the Lithography, Electroplating, and Molding (LIGA) process. [21][22][23][24] They have mainly attempted to increase the height to pitch ratio (aspect ratio) or field of view of gratings but realizing both goals at the same time has posed severe difficulties.…”
Section: Introductionmentioning
confidence: 99%