Fabrication of Discrete Track Media by Cr Ion Implantation

Effects of lateral straggling of ions on patterned media fabricated by nitrogen ion implantation

“…In this method, tracks or bits are magnetically isolated by the area where the saturation magnetization (M s ) or the perpendicular anisotropy (K u ) are reduced by implanting non-magnetic ions. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] We previously reported that larger reduction of the M s in the ion-implanted area was important for obtaining higher signal quality. 15 On the other hand, a masked area needs to be protected from the process damages of the ion implantation.…”