“…Similarly, Tsai, et al, used planar p-n junction patterned substrates to generate an array of tunable electric fields [Park & Phaneuf, 2003;Tsai et al, 2005]. Several other substrates are used for electrostatic deposition such as TEM grids (~3 mm in diameter) with thin holey carbon films [Anumolu et al, 2011], silicon wafers, and glass substrates pretreated in KOH and UVO-cleaner [Kang et al, 2011[Kang et al, , 2012. The optimum deposition time onto holey carbon TEM grids requires the product of the aerosol number density and time to exceed 3000 particle .…”