2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) 2014
DOI: 10.1109/sbmicro.2014.6940113
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Fabrication of low dark-count PureB single-photon avalanche diodes

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Cited by 3 publications
(7 citation statements)
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“…The breakdown voltage of the active region (VBR,act) is simulated in 1D for PureB SPADs with Qe1 equal to 1×10 12 cm -2 , 3.5×10 12 cm -2 , 6×10 12 cm -2 and 8.5×10 12 cm -2 . Measured 18 and simulated breakdown voltages are compared in Figure 2 for different Qe1 and the results show excellent agreement confirming that the impact ionization starts in the active region. When the SPAD is operated at VEX higher than VBR,per-VBR,act an additional DCR source at the periphery starts to dominate the total DCR 15 .…”
Section: Analysis Of Dcr In Pureb Spadsmentioning
confidence: 58%
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“…The breakdown voltage of the active region (VBR,act) is simulated in 1D for PureB SPADs with Qe1 equal to 1×10 12 cm -2 , 3.5×10 12 cm -2 , 6×10 12 cm -2 and 8.5×10 12 cm -2 . Measured 18 and simulated breakdown voltages are compared in Figure 2 for different Qe1 and the results show excellent agreement confirming that the impact ionization starts in the active region. When the SPAD is operated at VEX higher than VBR,per-VBR,act an additional DCR source at the periphery starts to dominate the total DCR 15 .…”
Section: Analysis Of Dcr In Pureb Spadsmentioning
confidence: 58%
“…Simulations of the PureB SPAD fabrication steps 18 are performed using Sentaurus Process 19 . The structure consists of an n + buried layer simulated with a constant phosphorus doping concentration of 10 18 cm -3 on top of which a 1-µm-thick epitaxial region (tepi) is deposited with a phosphorus doping concentration of Nepi = 10 15 cm -3 .…”
Section: Sources Of Dcr In Pureb Spads 21 Pureb Spad Process-simulatmentioning
confidence: 99%
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