Fabrication of magnetic nanostructures by direct laser interference lithography on supersaturated metal mixtures

Tselev, Alexander; Polushkin, N. I.; Verevkin, Yu K; Gorbunov, A.; Petryakov, V N; Pompe, W.

doi:10.1007/s003390051538

Cited by 16 publications

(11 citation statements)

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“…4). Still ring shaped structures are formed, but these structures appear similar to the illumination of the other materials at high laser intensities, where the structures look like typical dewetting structures [14,IS]. The qualitative appearance of the structures for both groups is independent of the period which we examined (500 nm-3 J.lm).…”

Section: Resultsmentioning

confidence: 77%

Nanostructuring of thin films by ns pulsed laser interference

et al. 2010

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We show that nanosecond pulsed laser interference can be used to structure surfaces on a nanoscale. With this method, we are able to create hollow structures on various thin films like Ta, Ni, Au, Cu, Co, and NiTi. We find that the structuring mechanism is related to the mechanical effect of thermal expansion upon melting. To corroborate this model, we study materials with an abnormal behavior at the melting point like Si, Ge, or Bi, as they contract upon melting.

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Section: Resultsmentioning

confidence: 77%

Nanostructuring of thin films by ns pulsed laser interference

et al. 2010

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“…There are generally three types of approaches to grow metallic nanostructures, including: (1) shadow deposition onto patterned substrates formed by selfassembly or self-organization, (2) direct deposition on substrates that allow the Vollmer-Weber growth, and (3) formation of nano-particles in a laser plume in an ambient pressure of inert gases or in solutions. In addition, pulsed laser beams can also be used to create nanostructures by direct laser interference lithography [150,151].…”

Section: Metallic Nanostructuresmentioning

confidence: 99%

Growth and magnetism of metallic thin films and multilayers by pulsed-laser deposition

Shen

Gai

Kirschner

2004

Surface Science Reports

142

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“…Nanosecond pulsed laser interference patterning allows preparing microstructured surfaces in a single shot on areas of mm 2 . This has been shown in several publications for direct patterning of surfaces [1][2][3][4][5][6][7][8] or for the generation of surface energy patterns [9]. Nevertheless for a controlled manufacturing process the understanding of the involved mechanims is essential.…”

Section: Introductionmentioning

confidence: 99%

Pulsed Laser Interference Patterning of Metallic Thin Films

et al. 2012

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Pulsed laser interference is applied to metallic and semiconductor thin films in the thickness range of 40-100 nm. At intensities which induce local melting we can observe local retraction of the molten material towards the unmolten areas due to dewetting. Thus micropatterning of surface gets feasible. Although this dewetting induced retraction should be a common behaviour of metals on oxide surfaces, two groups of materials can be distinguished. In the first group the former molten areas get completely blank of metal while in the second group a material droplet remains in the center of the molten area. We show that this behaviour can be attributed to a distinctly different way of liquid movement upon local melting.

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Fabrication of magnetic nanostructures by direct laser interference lithography on supersaturated metal mixtures

Cited by 16 publications

References 0 publications

Nanostructuring of thin films by ns pulsed laser interference

Nanostructuring of thin films by ns pulsed laser interference

Growth and magnetism of metallic thin films and multilayers by pulsed-laser deposition

Pulsed Laser Interference Patterning of Metallic Thin Films

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