Nanostructuring of thin films by ns pulsed laser interference

Riedel, Stephen; Schmotz, Markus; Leiderer, Paul; Boneberg, Johannes

doi:10.1007/s00339-010-5822-x

Cited by 26 publications

(18 citation statements)

References 17 publications

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“…First we show the results of the group of materials that behave similar to former results by other groups [6,8]. For these materials (Si, Bi, Ge) we found that the dewetting leads to areas which are free of metal ( Fig.…”

Section: Resultssupporting

confidence: 77%

“…As we pointed out earlier [8] the formation of the membrane is connected to the expansion of the liquid upon melting. If the expansion upon melting cannot be neglected the metal gains vertical interia upon melting which might lead to detachment from the surface in the case of low adhesion.…”

Section: Resultsmentioning

confidence: 65%

“…Nanosecond pulsed laser interference patterning allows preparing microstructured surfaces in a single shot on areas of mm 2 . This has been shown in several publications for direct patterning of surfaces [1][2][3][4][5][6][7][8] or for the generation of surface energy patterns [9]. Nevertheless for a controlled manufacturing process the understanding of the involved mechanims is essential.…”

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Interference Patterning of Metallic Thin Films

et al. 2012

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Pulsed laser interference is applied to metallic and semiconductor thin films in the thickness range of 40-100 nm. At intensities which induce local melting we can observe local retraction of the molten material towards the unmolten areas due to dewetting. Thus micropatterning of surface gets feasible. Although this dewetting induced retraction should be a common behaviour of metals on oxide surfaces, two groups of materials can be distinguished. In the first group the former molten areas get completely blank of metal while in the second group a material droplet remains in the center of the molten area. We show that this behaviour can be attributed to a distinctly different way of liquid movement upon local melting.

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Section: Resultssupporting

confidence: 77%

Section: Resultsmentioning

confidence: 65%

Section: Introductionmentioning

confidence: 99%

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Pulsed Laser Interference Patterning of Metallic Thin Films

et al. 2012

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“…In comparison to these methods laser interference lithography offers the opportunity for fast and flexible realization of periodic structures over macroscopic area in a single processing step [4][5][6][7][8]. In laser interference lithography periodic structures are created either in a photoresist layer covering the material surface [8] or, when high energy lasers are used, directly in the material of interest [4][5][6][7]. In the latter technique, called direct laser interference lithography (DLIL), the superposition of coherent laser beams, originating from the same source, locally modifies the properties of irradiated materials.…”

Section: Introductionmentioning

confidence: 99%

Micropatterning of Silicon Surface by Direct Laser Interference Lithography

et al. 2012

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Direct laser interference lithography is a new and low cost technique which can generate the line-or dot-like periodic patterns over large areas. In the present work, we report on direct fabrication of micrometer structures on Si surface. In the experiments the pulsed high power Nd:YAG laser operating at 1064 nm wavelength was used. Two-beam configuration with an angle of incidence of 40• was employed and different laser fluences up to 2.11 J/cm 2 were tested. Areas about 1 cm in diameter have been processed with a single pulse of 10 ns. The laser treated samples were analyzed by atomic force microscopy to investigate the surface topography and to measure the size and depth of the achieved structures. We observed periodic line-like arrays with grating period of the order of 1 µm.

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“…12 It has been clarified that a flow of Si melt (capillary wave) is responsible for formation of columns or cones and that their growth is promoted by reactive gases. [13][14][15][16] A regular arrangement of these columns and cones has also been studied extensively; e.g., installation of a photomask [17][18][19] or a microlens array (glass spheres) 20,21 on a Si plate, spatial modulation of a laser beam by use of a liquid-crystal cell, 5 interference-fringe formation by multi-beam irradiation, 22 and successive irradiation of two beams with orthogonal polarization directions. 23,24 Whereas laser irradiation is usually achieved in vacuum or a gas phase (air, inert or reactive gas), a liquid-phase processing is currently attracting interests for constructing more refined textures.…”

Section: Introductionmentioning

confidence: 99%

Polygonal pits on silicon surfaces that are created by laser-assisted chemical etching

Saito

Kimura

2017

AIP Advances

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Laser-assisted chemical etching was conducted for creating periodic textures on silicon surfaces. Silicon plates with the (111) surface orientation were immersed in an aqueous solution of potassium hydroxide, and a pulsed laser beam (532 nm wavelength, 5 ns duration, 10 pulse/s) was irradiated on their surface to promote anisotropic etching. The laser beam was patterned by using a glass capillary plate that contained a hexagonal array of micropores (10μm diameter, 12μm period). The focused beam projected the hexagonal image on the silicon surface, creating bright spots of 4μm period. During the laser irradiation process of 3 min, both laser-induced ablation and chemical etching took place at these bright spots. After stop of laser irradiation, the chemical etching progressed further, and consequently, a periodic array of triangular or hexagonal pits emerged on the silicon surface. The direction of the triangular pits changed by rotation of the silicon plate. When a silicon plate with the (100) surface orientation was used, diamond or rectangular pits were created on its surface. The mechanism of this polygonal texturing was explained by using the normal and intersecting vectors of the (100), (110), and (111) planes that exhibited different etching rates.

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Nanostructuring of thin films by ns pulsed laser interference

Cited by 26 publications

References 17 publications

Pulsed Laser Interference Patterning of Metallic Thin Films

Pulsed Laser Interference Patterning of Metallic Thin Films

Micropatterning of Silicon Surface by Direct Laser Interference Lithography

Polygonal pits on silicon surfaces that are created by laser-assisted chemical etching

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