Fabrication of multi-wavelength visible and infrared filter for solar atmosphere tomographic imaging

Kong, Mingdong; Guo, Chaowei; Li, Bincheng; He, Wei; Wei, Ming

doi:10.3788/col201715.123101

Cited by 4 publications

(2 citation statements)

References 9 publications

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“…Environmental durability of the prepared three-wavelength HR coating was tested on the basis of temperature cycling and humidity requirements of the Chinese military specifications GJB150.5A-2009 and GJB150.9A-2009. Parameters for temperature cycling and humidity tests were consistent with Reference [32]. No physical damages were observed after temperature cycling and humidity tests, and no coatings were removed under the adhesion test.…”

Section: Multilayer Coatingssupporting

confidence: 73%

“…As expected, the thickness and refractive index of SiO2 film could be estimated by fitting the transmission curve with commercial software like OptiRE [31]. The method had been introduced in detail in the previous research paper [32]. Besides, ellipsometric measurement was an excellent choice to determine the parameters of the SiO2 film deposited on Si substrate [33].…”

Section: Single-layer Coatingsmentioning

confidence: 99%

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Fabrication of Ultralow Stress TiO2/SiO2 Optical Coatings by Plasma Ion-Assisted Deposition

Guo

Kong

2020

Coatings

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Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550 nm was optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature was studied as well. In conclusion, it was demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress was as low as 1.4 MPa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and postdeposition treatments.

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Section: Multilayer Coatingssupporting

confidence: 73%

Section: Single-layer Coatingsmentioning

confidence: 99%