Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass

Abstract

Interrelationship between the shear modulus of a metallic glass, concentration of frozen-in defects, and shear modulus of the parent crystal Appl. Phys. Lett. 102, 091908 (2013); 10.1063/1.4794987On the nature of enthalpy relaxation below and above the glass transition of metallic glassesHere, the authors fabricated a mold consisting of nanodot arrays with an 18-nm pitch and performed nanoimprinting of metallic glass for developing bitpatterned media (BPM) with an areal recording density of 2 Tbit/in. 2 . Specifically, they investigated the feasibility of SiO 2 /Si mold fabrication by metal mask patterning with focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). SiO 2 was etched with a mixed gas of CHF 3 and O 2 , resulting in successful fabrication of convex nanodot arrays with an 18-nm pitch. The authors attempted nanoimprinting of Pd-based metallic glass with the fabricated SiO 2 mold and clearly confirmed the replication of the fine nanohole pattern. These results suggest that the proposed FIB-CVD and RIE process is a promising method for fabricating ultrafine nanodot arrays and that metallic glasses are excellent nanoimprintable materials for mass-produced nanodevices such as BPM with ultrahigh recording density.

Development of Functional Metallic Glassy Materials by FIB and Nanoimprint Technologies

“…The surface morphology of the deposited Pt mask was observed by an atomic force microscopy (AFM) and a field emission scanning electron microscopy (SEM) with a low accelerating voltage. Figure 12.11a, b show a cross-sectional microphotograph of the Pt-deposited SiO 2 /Si substrate with L p = 33 nm [57]. Pt was found to exist at a depth of about 20 nm under the SiO 2 surface near the center of the irradiation point.…”

Large‐Area Resonance‐Tuned Metasurfaces for On‐Demand Enhanced Spectroscopy

“…NIL has been employed for nanofabrication of electronic and photonic structures [15] and for parallel production of a large number of functional elements [16]. Even high-density nanostructures more than a teradot/inch 2 have been successfully produced [17,18].…”

Edge-illumination x-ray phase contrast imaging with Pt-based metallic glass masks

“…36 Nanoimprinting represents the fabrication of micro-and nano-devices by embossing features from a hard mold onto thermoplastic materials such as metallic glasses in their super-cooled liquid region (SCLR). 37,38 In this work, two absorption masks were designed according to an EI XPCI system described in Sec. III.…”