Traditional screen printing is an easy approach commonly
used for
conductive pattern fabrication of electronics but lacks high resolution.
Photolithography offers better resolution but is complex. Photosensitive
silver pastes (PSP) combine the benefits of both but suffer from undercut
issues, causing uneven etching, decreased interfacial adhesion, and
thus poor resolutions. In this study, we explore the use of molecular
precursors (i.e., silver oxalate) to replace metallic silver particles
and enhance the depth of light penetration. Our findings demonstrate
a successful solution to the undercut issue, achieving an undercut
index of 1.0, indicating an undercut-free scenario and enabling higher
resolutions in line and pattern formation. Additionally, our research
confirms the feasibility of multilayer stacking of photosensitive
pastes, achieving unprecedented aspect ratios in line patterns. By
replacing 25% of micrometer silver powder with silver oxalate (PSP-25),
we achieved optimal line widths as fine as 10 μm. The three-layer
stack of PSP-25 reached a substantial aspect ratio with a height of
29.4 μm and an optimal fringe pattern resolution of 10 μm
line width with a 15 μm aisle width. Utilization of silver oxalate
was observed to slightly expand the line width, likely due to light
scattering by the fine silver nanoparticles (∼40 nm) formed
during the photodecomposition of silver oxalate.