Fabrication of polycrystalline TiO2 nanopatterns by TiO2 sol base imprint lithography

Yoon, Kyung Min; Yang, Ki Yeon; Lee, Heon

doi:10.1016/j.tsf.2009.07.056

Cited by 33 publications

(33 citation statements)

References 13 publications

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“…Thermal embossing or nanoimprinting of ceramic precursor materials has attracted the interest of researchers and technologists for several decades [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] because of the inherent advantages of directly nanopatterning and micropatterning functional films without additional steps of ion etching and lithography-resist removal. 18 In photonics applications, for example, nanoscale patterning allows for the control of light propagation through thin-film structures.…”

Section: Introductionmentioning

confidence: 99%

Pressureless nanoimprinting of anatase TiO2 precursor films

Richmond

Zhang

Cao

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Scalable nanoimprint patterning of thin graphitic oxide sheets and in situ reduction J. Vac. Sci. Technol. B 29, 011023 (2011); 10.1116/1.3533936 UV irradiation effect on sol-gel indium tin oxide nanopatterns replicated by room-temperature nanoimprint A soft-imprint method for obtaining anatase TiO 2 nanostructures is reported. The method is de facto pressureless and is performed without the need for dedicated imprint equipment. A titanium butoxide-based sol precursor is prepared with a heavy alcohol, methoxy ethanol, as a solvent. The use of an incompletely cross-linked very soft polydimethylsiloxane mold is found to be crucial for obtaining large-area high-quality imprints. The authors discuss quantitatively the observed substrate-constrained shrinkage of pillars and lines ͑ridges͒ during annealing.

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Section: Introductionmentioning

confidence: 99%

Pressureless nanoimprinting of anatase TiO2 precursor films

Richmond

Zhang

Cao

et al. 2011

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…The TiO 2 -gel pattern was then converted to crystalline TiO 2 by annealing at 600°C for one hour in atmospheric ambient. Details of experimental conditions can be found elsewhere [22].…”

Section: Methodsmentioning

confidence: 99%

Enhancement of light extraction in GaN based LED structures using TiO2 nano-structures

Yoon

Yang

Byeon

et al. 2010

Solid-State Electronics

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“…In our previous work, low pressure direct NIL using a PDMS mold and a sol containing an oxide precursor was established [96]. The procedure of the NIL process using a sol is described in Figure 6a.…”

Section: Nil Processes Using Sol-gel Solutionsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Fabrication of polycrystalline TiO2 nanopatterns by TiO2 sol base imprint lithography

Cited by 33 publications

References 13 publications

Pressureless nanoimprinting of anatase TiO2 precursor films

Pressureless nanoimprinting of anatase TiO2 precursor films

Enhancement of light extraction in GaN based LED structures using TiO2 nano-structures

Recent progress in direct patterning technologies based on nano-imprint lithography

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