Fabrication of pure gold nanostructures by electron beam induced deposition with Au(CO)Cl precursor: deposition characteristics and primary beam scattering effects

Abstract

Fabrication of pure gold nanostructures by electron beam induced deposition with Au(C0)CI precusor: deposition characteristics and primary beam scattering effects.

Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

“…The two Au(I) compounds that have been used successfully in prior studies of gold EBID: ClAu(PF 3 ) [27,28] ClAuCO [61] are both of the type XAuL, featuring one halide ligand X and one strongly p-acidic neutral twoelectron donor ligand (L = CO, PF 3 ) which is stable as a gas phase species. We hypothesize that XAuL provides an optimal framework to create organometallic precursors capable of depositing pure Au by EBID via the following reaction sequence:…”

“…Although ClAu(PF 3 ) [27,28] and ClAuCO [61] have both been used to deposit gold structures of fairly high purity, the sensitivity of these compounds toward temperature, air, moisture, and light renders both impractical for storage and scale-up to the quantities needed for any kind of practical applications. In addition to being stable, viable precursors must also be suitably volatile for a vacuum-based deposition process such as EBID.…”

Purification of Au EBID structures by electron beam post-irradiation under oxygen flux at room temperature

“…Although this technique allows controlled and resist-free direct-deposition of three dimensional nanostructures in almost any desired shape, deposition of highly pure material is rarely achieved (exceptional precursors like Fe(CO) 5 , Co 2 (CO) 8 and Au(CO) Cl lead to deposition of highly pure metals [4][5][6]). Typically, for fabrication of metallic structures, a metal-organic (M-O) precursor in gaseous state is injected in the close vicinity of the substrate in a Scanning Electron Microscope (SEM).…”

Mask‐free prototyping of metal‐oxide‐semiconductor devices utilizing focused electron beam induced deposition

“…As reported in literature , the main drawback of the FEBID of Au structures has a relatively low metal content due to carbon contamination. Historically, the Au content in structures deposited from Me 2 ‐gold (III)‐acac and Me 2 ‐gold (III)‐tfac precursors was below 20 at.% . However, in a separate, more comprehensive study using the same precursor as in this set of experiments, we managed to improve the Au content in free‐standing FEBID nanostructures.…”

“…With FEBID noble metals can be deposited in a single process step . Due to its superior precision, FEBID is a potential candidate for processing of 2D and 3D nanostructures for several applications , including magnetic materials for nanomagnet logic technology . FEBID structures made of noble metals can also be used for electrical contacts on typical nanodevices such as nanowires.…”