Fabrication of sub 50-nm direct-patterned Pb(Zr,Ti)O3 films by electron beam-induced metal-organic deposition

Abstract

Direct-patterned lead zirconate titanate (PZT) films prepared from an electron beam sensitive stock solution were investigated for advanced stage applications in sub 50-nm patterned systems. The required electron beam dose for the direct-patterning of PZT precursor films was 4.5 mC/cm 2 . The PZT precursor films with pattern size of 500×500 μm 2 were exposed to an electron beam for 2 h and annealed at 400°C for 30 min under an O 2 ambient. After exposure and annealing, values of the remnant polarization and coercive field were 7.0 μC/cm 2 and 97 kV/cm at 10 V, respectively. These results suggest a possible application of PZT films in micro-or nanoelectromechanical systems.