2015
DOI: 10.1016/j.physe.2015.07.036
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Fabrication of thin-film transistor based on self-assembled single-walled carbon nanotube network

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Cited by 9 publications
(5 citation statements)
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“…The scanning electron micrograph (SEM) in Fig. 1 are presents the random distribution of the SWNT network (density of ~1.4 μm −2 ) on wafer fabricated using a self-assembly technique 20 (detailed in the Methods section). Figure 1b shows the UV-Vis-NIR absorption spectra for the pristine, OA, and PEI doped SWNT network.…”
Section: Resultsmentioning
confidence: 99%
“…The scanning electron micrograph (SEM) in Fig. 1 are presents the random distribution of the SWNT network (density of ~1.4 μm −2 ) on wafer fabricated using a self-assembly technique 20 (detailed in the Methods section). Figure 1b shows the UV-Vis-NIR absorption spectra for the pristine, OA, and PEI doped SWNT network.…”
Section: Resultsmentioning
confidence: 99%
“…The densities of SWCNT network have been examined as a function of concentration and assembly time. It has been detected that the density of SWCNT network increases from 0.6 mm 2 to 2.1 mm 2 , as the average on-state current (Ion) increases from 0.5 mA to 1.47 mA [36].…”
Section: Applications Of Nanoelectronics Related To Carbon-based Matementioning
confidence: 99%
“…Once dispersed CNTs can be deposited onto a variety of substrates using spin-coating 3,[44][45][46][47] , vacuum-filtration 36,[48][49][50][51] , or incubation 6,10,18,39,52 . Incubation or dropcasting is among the simplest methods as it only involves functionalizing the substrates with molecules such as (3-Aminopropyl) triethoxysilane (APTES) 4,46,[53][54][55] , or poly-L-lysine (PLL) 7,8,10,32,56 and then covering or immersing them in a dispersion of CNTs. In this thesis solution deposition on PLL coated surfaces has been used and this method has also been modified by preforming deposition in a humid environment to better control network morphology as will be discussed in Section 3.3.4.…”
Section: List Of Tablesmentioning
confidence: 99%
“…This means that there has been no work done on tailoring the metallic content of CNT networks precisely. Coverage control has been demonstrated with drop casting by either controlling deposition time 6,7,9,54,58 or dilution of the solution 59 neither of which are precise methods. Usually, high coverage is desired to increase the device current and therefore precise means of coverage control is also lacking.…”
Section: List Of Tablesmentioning
confidence: 99%
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