Fabrication of TiO₂nano-to-microscale structures using UV nanoimprint lithography

Abstract

TiO2-nanoparticle-dispersed resin was prepared to form various nanoscaled structures using UV nanoimprint lithography (UV NIL). This resin-made of TiO2 nanoparticles, a monomer, solvent, and UV initiator-showed variations in refractive index depending on the nanoparticle concentration. TiO2 nano-to-microscale patterns were fabricated on various substrates such as Si wafer and glass, and even on flexible substrates, by using UV NIL, which offers advantages such as low cost, large area, and high throughput. Low-aspect-ratio, high-aspect-ratio, and microconvex patterns were fabricated using the NIL process. The optical properties of the patterns were analyzed using UV-vis spectrophotometry.

Nano-Architectural Approaches for Improved Intracortical Interface Technologies

“…In contrast to EBL, the mechanical properties of the resist layer are of prime importance as the Young’s modulus of the resist must be lower than the Young’s modulus of the mold. In hot embossing NIL, thermoplastic resists are imprinted with the mold at temperatures 70–90° above T g , then cooled before releasing from the mold ( Figure 2B ) ( Guo, 2007 ; Choi et al, 2013 ). Alternatively, low-viscosity UV-curable resists can be cured by UV light at ambient temperatures while being imprinted with the mold ( Schulz et al, 2000 ; Guo, 2007 ).…”

Oxygen insensitive thiol–ene photo-click chemistry for direct imprint lithography of oxides

“…Nanoparticle suspensions have also been used for direct nanoimprinting with a so PDMS mold. 50 This approach has been used to directly fabricate threedimensional structures of multicomponent oxides like indium tin oxide and nickel ferrite. 51,52 Photosensitive ethylhexanoatebased oxide patterning has been reported that utilizes photobreakable precursors rather than photo-curable monomers.…”

Nano‐ and Micro‐Sized Fe2O3 Structures Fabricated by UV Imprint Lithography

“…The replicated PDMS mold was removed from the imprinted substrate when the resin was cured by the UV light. Nano‐ to microscale structures composed of Fe 2 O 3 nanoparticles on various substrates can be fabricated through this UV imprint lithography …”