2003
DOI: 10.1364/ao.42.005450
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Fabrication of two-dimensional photonic crystals with controlled defects by use of multiple exposures and direct write

Abstract: We have developed an approach for relatively rapid and easy fabrication of large-area two-dimensional (2-D) photonic crystal structures with controlled defects in the lattice. The technique is based on the combination of two lithographic steps in UV-sensitive SU-8 photoresist. First, multiple exposures of interference fringes are used in combination with precise rotation of the sample to define a 2-D lattice of holes. Second, a strongly focused UV laser beam is used to define line-defect waveguides by localize… Show more

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Cited by 74 publications
(39 citation statements)
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“…We expect that the localization of the optical excitations would lead to ready integration of the solid state cavity devices with extant devices. Advances relevant to our proposal in semiconductor quantum devices include single photon sources operating at room temperature [10,11],high-Q microsheres and their coupling to nanodots [4] and to fibers [12], and photonic lattice waveguides and cavities [13,14].…”
mentioning
confidence: 99%
“…We expect that the localization of the optical excitations would lead to ready integration of the solid state cavity devices with extant devices. Advances relevant to our proposal in semiconductor quantum devices include single photon sources operating at room temperature [10,11],high-Q microsheres and their coupling to nanodots [4] and to fibers [12], and photonic lattice waveguides and cavities [13,14].…”
mentioning
confidence: 99%
“…An example two-beam configuration to record a 1D grating utilizing a single beam splitter and beam-directing mirrors is depicted in Figure 4(a). In any two-beam configuration, multiple exposures are required to generate more complex 2D and 3D patterns in a photo-sensitive material [76][77][78][79]. This is often accomplished by incorporating a rotating sample stage at the recording plane [80][81][82][83].…”
Section: Multi-beam Interference Configurationsmentioning
confidence: 99%
“…Two decades later, multiple MBIL exposures were proposed to generate more complex 2D patterns in a photoresist [138]. Since then, a wide range of structures have been recorded via MBIL using near-infrared [129,[139][140][141][142], visible light [18,31,32,62,88,[143][144][145][146][147][148][149][150][151][152][153], ultraviolet (UV) [62,77,78,99,115,[154][155][156][157][158][159][160], deep-UV [92,101,142,[161][162][163], and extreme-UV sources [164][165][166][167].…”
Section: Multi-beam Interference Lithography and Nano-electronicsmentioning
confidence: 99%
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“…(63,66,67) In practice, it is much more convenient to arrange two beams with different geometries to access a wide range of lattices with variable unit sizes and large contrast. For example, both square and tetragonal 2D lattices can be attained by simply rotating the sample stage with a precise control of the in-plane rotation of the substrate.…”
Section: Formation Of Two-dimensional (2d) Microstructuresmentioning
confidence: 99%