Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Liu, Longhua; Liu, Gang; Xiong, Ying; Chen, Jie; Li, Wenjie; Tian, Yangchao

doi:10.1007/s00542-009-0972-5

Cited by 8 publications

(10 citation statements)

References 12 publications

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“…This phenomenon has been readily exploited using various techniques to fabricate diffractive optics, such as Fresnel zone plates. Such techniques are particularly attractive in applications where the use of conventional refractive optics is inefficient or impractical 18,19 . Zone plates can be quite efficient in generating lens-like behavior, however they are also very complex often requiring hundreds of zones to achieve high diffraction efficiency.…”

Section: Tubes As Optical Componentsmentioning

confidence: 99%

Direct-write diffracting tubular optical components using femtosecond lasers

McMillen

Bellouard

2014

SPIE Proceedings

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Over the last decade, femtosecond lasers have been used extensively for the fabrication of optical elements via direct writing and in combination with chemical etching. These processes have been an enabling technology for manufacturing a variety of devices such as waveguides, fluidic channels, and mechanical components.Here, we present high quality micro-scale optical components buried inside various glass substrates such as soda-lime glass or fused silica. These components consist of high-precision, simple patterns with tubular shapes. Typical diameters range from a few microns to one hundred microns. With the aid of high-bandwidth, high acceleration flexure stages, we achieve highly symmetric pattern geometries, which are particularly important for achieving homogeneous stress distribution within the substrate.We model the optical properties of these structures using beam propagation simulation techniques and experimentally demonstrate that such components can be used as cost-effective, low-numerical aperture lenses. Additionally, we investigate their capability for studying the stress-distribution induced by the laser-affected zones and possible related densification effects.

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Section: Tubes As Optical Componentsmentioning

confidence: 99%

Direct-write diffracting tubular optical components using femtosecond lasers

McMillen

Bellouard

2014

SPIE Proceedings

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“…Previously, atomic layer deposition (ALD) has been used to deposit Al 2 O 3 and TiO 2 multilayer films onto AISI 316 austenitic stainless steel to form conformal nanometric layers . E-beam deposition is a simple method for depositing oxide films with a controllable thickness, even in a multilayer structure or in special structures. − With the E-beam method, less time is required than with the ALD method . In our experience of using magnetron sputtering, the thicknesses of upper layers decrease and are difficult to control.…”

Section: Introductionmentioning

confidence: 99%

Reflection of Blue Light Using Bi-Layer Al₂O₃–TiO₂ E-Beam Coating Films

Liu

Lin²,

Tzou

et al. 2018

Crystal Growth & Design

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E-beam deposition was used to deposit Al 2 O 3 and TiO 2 single-layer films onto glass substrates at 300 °C, with 6 sccm O 2 being introduced during the deposition process. Optical characterization of the films was conducted to evaluate whether the thickness was suitable for the formation of multipair reflective coatings. The refractive indices of the films measured at an optical wavelength of 450 nm were 1.742 (Al 2 O 3 ) and 2.206 (TiO 2 ). E-beam deposition was then used to deposit Al 2 O 3 − TiO 2 bilayer films in one, two, four, and six periods on glass substrates to fabricate multilayer films as broadband Bragg-reflecting coatings for blue light. The thicknesses of the Al 2 O 3 and TiO 2 films for the quarter wave condition were 51 and 64 nm, respectively. When one period of Al 2 O 3 −TiO 2 bilayer film was deposited on the glass substrate, the film had high transparency, and no reflective effect was observed. As two, four, and six periods were deposited on the glass substrates, the Bragg reflection effect became apparent. The reflectance ratio also increased with the number of periods. Cross-sectional observations showed that each Al 2 O 3 and TiO 2 film could be deposited well on glass substrates using E-beam deposition. The thicknesses of the Al 2 O 3 and TiO 2 films would have deviations to achieve an expected value, causing variations in the central frequency and bandwidth of the Bragg reflection effect for the Al 2 O 3 −TiO 2 bilayer films. We theorize as to why deviations in the films' thicknesses caused differences between (i) the theoretical and measured reflective spectra and (ii) the theoretical and measured central frequency and bandwidth values.

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“…In x-ray optics, high aspect ratio gratings [5–9] and zone plates [10–12] have broad applications in x-ray phase contrast imaging [13–15], x-ray astronomy [9], and high resolution x-ray microscopy [16]. The performance of these devices relies on the aspect ratio, the size and the profile of the structures.…”

Section: Introductionmentioning

confidence: 99%

Cryogenic Etching of High Aspect Ratio 400-nm Pitch Silicon Gratings

Miao

Chen

Mirzaeimoghri

et al. 2016

J. Microelectromech. Syst.

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The cryogenic process and Bosch process are two widely used processes for reactive ion etching of high aspect ratio silicon structures. This paper focuses on the cryogenic deep etching of 400 nm pitch silicon gratings with various etching mask materials including polymer, Cr, SiO2 and Cr-on-polymer. The undercut is found to be the key factor limiting the achievable aspect ratio for the direct hard masks of Cr and SiO2, while the etch selectivity responds to the limitation of the polymer mask. The Cr-on-polymer mask provides the same high selectivity as Cr and reduces the excessive undercut introduced by direct hard masks. By optimizing the etching parameters, we etched a 400 nm pitch grating to ≈ 10.6 μm depth, corresponding to an aspect ratio of ≈ 53.

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Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Cited by 8 publications

References 12 publications

Direct-write diffracting tubular optical components using femtosecond lasers

Direct-write diffracting tubular optical components using femtosecond lasers

Reflection of Blue Light Using Bi-Layer Al₂O₃–TiO₂ E-Beam Coating Films

Cryogenic Etching of High Aspect Ratio 400-nm Pitch Silicon Gratings

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Fabrication of X-ray imaging zone plates by e-beam and X-ray lithography

Cited by 8 publications

References 12 publications

Direct-write diffracting tubular optical components using femtosecond lasers

Direct-write diffracting tubular optical components using femtosecond lasers

Reflection of Blue Light Using Bi-Layer Al2O3–TiO2 E-Beam Coating Films

Cryogenic Etching of High Aspect Ratio 400-nm Pitch Silicon Gratings

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Product

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Reflection of Blue Light Using Bi-Layer Al₂O₃–TiO₂ E-Beam Coating Films